研究目的
Investigating a novel multi-layer approach of high band-gap birefringent coatings for zero-order thin film retarders and normal incidence polarizers based on all-silica nanostructures.
研究成果
The presented waveplates and polarizers can essentially improve maximal tolerated peak power and allow the production of more compact optical systems due to the low-tension of nano-structured coatings.
研究不足
The study focuses on the use of silica material and its structural morphology changes, which may limit the applicability to other materials. The optical resistance was tested only at 355 nm wavelength in ns regime.
1：Experimental Design and Method Selection:
The study employed oblique angle deposition process to fabricate zero-order thin film retarders and normal incidence polarizers.
2：Sample Selection and Data Sources:
Amorphous silica was deposited in a serial bi-deposition manner to form nano-structured anisotropic thin films.
3：List of Experimental Equipment and Materials:
The substrate was placed at an oblique angle to induce self-shadowing effect, leading to the growth of columnar nano-structure with elliptical shape cross-sections.
4：Experimental Procedures and Operational Workflow:
The combination of birefringent nano-structured and isotropic layers was used to form zero-order waveplates with desirable phase delay difference.
5：Data Analysis Methods:
Optical resistance was tested by measuring laser induced damage threshold of both optical elements at the wavelength of 355 nm in ns regime.
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