研究目的
To evaluate the electrochemical behavior of titanium nitride thin films deposited on silicon by plasma discharge technique in cathodic cage, focusing on the effect of the presence or absence of holes on the sides of the cathodic cage on the electrochemical properties of these films.
研究成果
The study confirmed the efficiency of the plasma deposition technique using cathodic cage for obtaining titanium nitride thin films with varied anodic properties. The configuration of the cages and the deposition conditions significantly influenced the films' electrochemical properties, demonstrating both capacitive and resistive behaviors. Further research is needed to explore the full range of possibilities of this technique.
研究不足
The study was limited to specific conditions of pressure, treatment time, and variations in temperature and gas flow. The influence of other potential variables was not explored. Additionally, the use of silicon wafers as substrates may not fully represent the behavior of films on other materials.
1：Experimental Design and Method Selection:
The study employed plasma discharge in a cathodic cage for depositing titanium nitride films on silicon substrates, varying temperature and gas flow conditions of N2 and H2. Electrochemical polarization and impedance spectroscopy techniques were used to analyze the films' properties.
2：Electrochemical polarization and impedance spectroscopy techniques were used to analyze the films' properties.
Sample Selection and Data Sources:
2. Sample Selection and Data Sources: Silicon wafers with crystallographic orientation (100) were used as substrates. Films were deposited under different conditions of gas flow and temperature.
3：List of Experimental Equipment and Materials:
A pulsed plasma nitriding reactor (SDS, Thor NP 5000), cathodic cages made of commercially pure titanium, and a potentiostat Ivium CompactStat for electrochemical measurements.
4：Experimental Procedures and Operational Workflow:
Films were deposited at 253 Pa for 2 hours under varied conditions. Electrochemical tests included polarization and impedance spectroscopy in a 3.5% NaCl solution.
5：5% NaCl solution.
Data Analysis Methods:
5. Data Analysis Methods: Data from electrochemical tests were analyzed using Nyquist and Bode plots to assess the films' capacitive and resistive behaviors.
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