研究目的
To study the effect of annealing on the surface morphology and roughness of nanostructured TiO2 thin films for photocatalytic activity applications.
研究成果
Annealing TiO2 thin films at 450°C significantly increases their surface roughness and grain size, which is beneficial for photocatalytic applications. Higher molarity TiO2 films exhibit greater roughness, with the 0.2 M sample showing the highest Ra and RMS values.
研究不足
The study is limited to the effect of annealing on TiO2 thin films' surface morphology and roughness. The photocatalytic activity's direct measurement was not included, focusing instead on the morphological properties that influence it.
1：Experimental Design and Method Selection:
The study used sol-gel method for synthesizing TiO2 thin films due to its advantages like low synthesis temperature and cost. Atomic Force Microscopy (AFM) was selected for surface morphology analysis.
2：Sample Selection and Data Sources:
TiO2 thin films of different molarities (0.1 M, 0.15 M, 0.2 M) were prepared and deposited on silicon substrates.
3：1 M, 15 M, 2 M) were prepared and deposited on silicon substrates.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Titanium butoxide (Ti(OBu)?), ethanol, glacial acetic acid, Triton X-100, silicon substrates, XE-100 Park Systems AFM.
4：Experimental Procedures and Operational Workflow:
TiO2 solutions were prepared, deposited on silicon substrates via spin coating, and annealed at 450°C. AFM was used to analyze surface topography and roughness before and after annealing.
5：Data Analysis Methods:
AFM analysis provided quantitative data on average roughness (Ra), root mean square (RMS), and coefficient of kurtosis (RKU).
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