研究目的
To create and pattern a simple anti-reflective light blocking layer compatible with more complicated and sensitive devices by using an aluminum light blocking layer covered by a scattering layer composed of Al2O3 nanoparticles in photoresist.
研究成果
By using an aluminum layer with a nanoparticle solution, a simplified anti-reflective layer can be created for applications in which scattering is acceptable. The layer shows very low reflectivity across the visible spectrum, comparable to other anti-reflective layers based on surface features.
研究不足
The method's effectiveness is limited by the wavelength of light, with lower wavelengths showing better performance. Additionally, the patterning process introduces some edge roughness.
1：Experimental Design and Method Selection:
The method involves using an aluminum light blocking layer covered by a scattering layer composed of Al2O3 nanoparticles in photoresist. The light blocking was performed using a deposition of aluminum, and the scattering anti-reflective layer was created by using 300 nm Al2O3 nanoparticles in AZ2020 negative photoresist.
2：Sample Selection and Data Sources:
The samples used were aluminum over glass wafers for light blocking testing and AZ2020 negative photoresist mixed with Al2O3 nanoparticles for the scattering layer.
3：List of Experimental Equipment and Materials:
Equipment includes thermal evaporation, sputtering, or electron beam evaporation techniques for aluminum deposition, and a Filmetrics F20 system for reflectivity measurements. Materials include aluminum, AZ2020 negative photoresist, and Al2O3 nanoparticles.
4：Experimental Procedures and Operational Workflow:
The nanoparticles were mixed into the photoresist by stirring and sonication. The layer was applied with standard spin-on processes, and patterning was done using standard photolithography.
5：Data Analysis Methods:
Reflectivity was measured using a Filmetrics F20 system and an integrating sphere with lasers of different wavelengths.
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