研究目的
Investigating the effect of substrate temperature on the microstructure, optical and electrical properties of ZnO films deposited by radio frequency magnetron sputtering.
研究成果
The increase of substrate temperature enhances the performance of ZnO films with a lower resistivity and a wider optical bandgap. High optical transmittance of 84% in the visible range was achieved, making ZnO films suitable for applications requiring high transparency and low resistivity.
研究不足
The study is limited to the effect of substrate temperature on ZnO films' properties and does not explore other deposition parameters or conditions that might also influence the films' characteristics.
1：Experimental Design and Method Selection:
Zinc oxide thin films were deposited on a glass substrate by radio frequency magnetron sputtering at different substrate temperatures. The effect of substrate temperature on the microstructure, optical and electrical properties was investigated.
2：Sample Selection and Data Sources:
A series of ZnO films were prepared on Corning 2000 glass substrate at different temperatures (25, 100, 200, and 275 oC).
3：List of Experimental Equipment and Materials:
Radio frequency magnetron sputtering system (ULVAC MB06-4703), atomic force microscopy (Seiko Instruments Inc. SPA 400), X-ray diffraction (Shimadzu LabX XRD-6000), spectrometer Lambda 750 from Perkin Elmer, Hall measurement system (Ecopia HMS-300).
4：0).
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: The substrate was cleaned and prepared before deposition. The chamber was evacuated, and ZnO films were deposited at different substrate temperatures. The films' microstructure, optical transmittance, and electrical properties were then examined.
5：Data Analysis Methods:
The grain size of ZnO films was calculated from XRD spectra using the Scherrer equation. Optical transmittance was measured, and electrical properties were evaluated using Hall effect measurements.
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