研究目的
To demonstrate the first growth of Nd2S3 thin films via MOCVD using new Nd precursors and to explore their potential for functional applications.
研究成果
The study successfully demonstrated the first growth of γ-Nd2S3 thin films via MOCVD using new Nd precursors. The films exhibited luminescent properties with optical bandgaps suitable for optoelectronic applications. The process offers a scalable route for the synthesis of RES materials without the need for post-deposition treatments.
研究不足
The study is limited by the oxophilicity of RE metals, which can lead to the formation of oxides or oxysulphides. The process also requires precise control of temperature and precursor reactivity to achieve high purity films.
1:Experimental Design and Method Selection:
The study employed MOCVD for the deposition of Nd2S3 thin films using two new Nd precursors.
2:Sample Selection and Data Sources:
Thin films were deposited on pre-cleaned Si(100) and fused silica substrates.
3:List of Experimental Equipment and Materials:
MOCVD reactor, Nd precursors, elemental sulphur, nitrogen carrier gas.
4:Experimental Procedures and Operational Workflow:
Films were grown at temperatures ranging from 400 °C to 600 °C, with precursor vaporizer temperatures set to 120 °C and sulphur source at 110 °C.
5:Data Analysis Methods:
XRD, SEM, AFM, RBS/NRA, XPS, UV/Vis absorption, and photoluminescence spectroscopy were used for characterization.
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Bruker AXS D8 Advance diffractometer
D8 Advance
Bruker
X-ray diffraction measurements
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FEI ESEM Dual Beam? Quanta 3D FEG
Quanta 3D FEG
FEI
Surface morphology analysis via SEM
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FLAME-S-VIS-NIR spectrometer
FLAME-S-VIS-NIR
Ocean Optics
Photoluminescence spectra measurement
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HeCd laser
IK3351R-G
Kimmon Electric Co., Ltd
Excitation of samples for PL measurements
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JPK Nanowizard III
Nanowizard III
JPK Instruments AG
Atomic force microscopy
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Cary 4000 UV/Vis spectrophotometer
4000
VARIAN
UV/Vis absorption measurements
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