研究目的
To describe a plasma spectrometer design based on advances in lithography and microchip stacking technologies for space and plasma edge applications.
研究成果
The tests demonstrated the feasibility of fabricating the structures necessary for a microscale, ion energy spectrometer. The design is suitable for non-perturbative insertion in plasma processing systems and provides a direct, angularly resolved, and instantaneous measurement of the ion energy spectrum.
研究不足
The initial collimator design had a taper that reduced the effective transparency to about 20%, and the energy analyzer plates were thicker than intended due to undercutting during DRIE processing.
1：Experimental Design and Method Selection:
The design incorporates a series of curved plate energy analyzers with an integrated collimator etched into a silicon wafer.
2：Sample Selection and Data Sources:
Tests were performed with a 5 keV electron beam to validate the collimator and energy analyzer elements.
3：List of Experimental Equipment and Materials:
A silicon wafer, electron beam, and imaging microchannel plate beam profile monitor were used.
4：Experimental Procedures and Operational Workflow:
The collimator and energy analyzer were tested for transmission efficiency and energy selectivity.
5：Data Analysis Methods:
The transmission through the collimator stack and the energy analyzer layer was measured and compared to design targets.
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