研究目的
To solve large-pixelated, complex inverse meta-optics design problems for high-quality optical devices using a segmented hierarchical evolutionary algorithm.
研究成果
The SHEA enables rapid and efficient inverse design of complex meta-optics with high fidelity, demonstrated through broadband and full-color meta-holograms. It offers improved performance over existing methods and has potential for future applications in nanoscale optical devices.
研究不足
The computational demand for large-pixelated designs may exceed regular personal computer capabilities; fabrication imperfections can cause distortions in experimental results; the algorithm's performance is dependent on the choice of fitness function.
1:Experimental Design and Method Selection:
The study employs a segmented hierarchical evolutionary algorithm (SHEA) for inverse design of meta-optics, specifically meta-holograms. It involves theoretical models for light diffraction and evolutionary processes with mutation operations.
2:Sample Selection and Data Sources:
Meta-holograms with large pixel arrays (e.g., 302x302 pixels) are designed. Target images are used for optimization.
3:List of Experimental Equipment and Materials:
Silicon nanopillars on sapphire substrates, fabricated using e-beam lithography and plasma etching.
4:Experimental Procedures and Operational Workflow:
Fabrication involves patterning with HSQ resist, etching, and removal. Optical measurements are conducted with lasers at different wavelengths.
5:Data Analysis Methods:
Fitness functions like RMSE and correlation coefficient are used to evaluate hologram quality, with simulations performed using Lumerical FDTD Solution.
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Simulation software
Lumerical FDTD Solution
Lumerical
Used for numerical simulations of the Si nanopillars and meta-optics designs.
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E-beam writer
Raith E-line
Raith
Used for patterning the metasurface on resist during fabrication.
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Inductively coupled plasma etching system
PlasmaPro System 100ICP180
Used for transferring patterns from resist into silicon layer during fabrication.
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CPU
Intel(R) Core (TM) i7-4770
Intel
Used for computational simulations and algorithm implementation.
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RAM
Memory used in the computer for simulations.
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Software
Matlab 2015
MathWorks
Used for implementing and running the evolutionary algorithms.
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Laser
Used for illuminating the metasurface in experiments at specific wavelengths.
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Substrate
UniversityWafer, Inc.
c-Si(100) epitaxially grown on sapphire substrate used for fabricating the metasurface.
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Resist
HSQ (hydrogen silsesquioxane)
Negative resist used in e-beam lithography for patterning.
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