研究目的
To fabricate a transparent superhydrophobic film on glass with self-cleaning and stability properties using a facile method, specifically RF magnetron sputtering, and to investigate the effects of film thickness and surface roughness on wettability and optical properties.
研究成果
The RF magnetron sputtering method successfully fabricated a transparent superhydrophobic ZnO film on glass with excellent self-cleaning and stability properties. Optimal sputtering time of 2 minutes provided a balance between superhydrophobicity and transparency. The film demonstrated stability against corrosive liquids, temperature variations, high-speed water impact, and fog. This facile and controllable process has potential applications in solar cells, car windshields, and display windows.
研究不足
The study may have limitations in scalability for very large areas, long-term durability under extreme conditions beyond tested ranges, and potential cost considerations for industrial applications. Optimization of sputtering parameters for different materials or substrates was not explored.
1：Experimental Design and Method Selection:
RF magnetron sputtering was used to construct nano-scale structures on glass substrates, followed by annealing and surface modification with HDTMS to achieve superhydrophobicity. The design rationale was to control surface roughness and film thickness to balance superhydrophobicity and transparency.
2：Sample Selection and Data Sources:
Ultrasonically cleaned glass slides were used as substrates. Sputtering time varied from 0 to 15 minutes to study its effects.
3：List of Experimental Equipment and Materials:
Equipment includes a sputter chamber, muffle furnace, Dropmeter A-100p for contact angle measurements, FE-SEM SU8020 for morphology analysis, Dektak 150 surface profiler for thickness and roughness, and Phantom V7.3 high-speed camera for droplet impact recording. Materials include Zn target, Ar gas, HDTMS solution, and carbon nanoparticles for self-cleaning tests.
4：3 high-speed camera for droplet impact recording. Materials include Zn target, Ar gas, HDTMS solution, and carbon nanoparticles for self-cleaning tests. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Substrates were placed in the sputter chamber with specified parameters (target-substrate distance 10 cm, base pressure 4.0e-3 Pa, Ar pressure 1.5 Pa, power 100 W). After sputtering, samples were annealed at 400°C for 30 min, modified with 2 wt% HDTMS for 60 min, and dried at 90°C for 30 min. Wettability, morphology, thickness, roughness, and stability were characterized.
5：0e-3 Pa, Ar pressure 5 Pa, power 100 W). After sputtering, samples were annealed at 400°C for 30 min, modified with 2 wt% HDTMS for 60 min, and dried at 90°C for 30 min. Wettability, morphology, thickness, roughness, and stability were characterized. Data Analysis Methods:
5. Data Analysis Methods: Contact angles and sliding angles were measured at five spots per sample. Surface morphology was analyzed via SEM. Film thickness and roughness were measured with a profiler. Droplet impact was recorded and analyzed visually.
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Dropmeter
A-100p
Characterization of contact angles and sliding angles of water droplets on samples.
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Field Emission Scanning Electron Microscope
SU8020
Analysis of surface morphology.
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Surface Profiler
Dektak 150
Measurement of film thickness and surface roughness (Ra).
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High-Speed Camera
Phantom V7.3
Recording the collision process of impacting droplets.
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Sputter Chamber
Used for RF magnetron sputtering to deposit Zn and form ZnO films.
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Muffle Furnace
Annealing the substrates at 400°C for 30 minutes.
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Zn Target
Sputtering target used to deposit zinc, which is transformed into ZnO after annealing.
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HDTMS Solution
Surface modification agent to lower surface energy and achieve superhydrophobicity.
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Carbon Nanoparticles
Used as dust in self-cleaning property tests.
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