1：Experimental Design and Method Selection:

The study used vacuum arc discharge for deposition and ion beam analysis (EBS and NRA) for characterization, optimized to avoid peak overlaps. Other methods like TOF-ERDA, SEM/EDX, and XRD were used for verification.

2：Sample Selection and Data Sources:

Four substrates were used: Si(100), stainless steel SS316, AlN coated soda lime glass, and Teflon. Samples were prepared as per previous work.

3：List of Experimental Equipment and Materials:

Equipment includes a V-1000 'U' vacuum arc deposition system, 3 MV HVEE tandem ion beam accelerator, PIPS detectors, TOF-ERDA system, Tescan Vega II XMU SEM, and Stoe Transmission X-ray diffractometer. Materials include high-pure Ti target and various substrates.

4：Experimental Procedures and Operational Workflow:

Films were deposited simultaneously on substrates under vacuum with nitrogen discharge. Ion beam measurements used alpha beams at 2 MeV and 4.5 MeV, with detectors at specific angles and absorbers. SEM/EDX and XRD were performed for additional analysis.

5：5 MeV, with detectors at specific angles and absorbers. SEM/EDX and XRD were performed for additional analysis. Data Analysis Methods:

5. Data Analysis Methods: Data were analyzed using SIMNRA and Multi-SIMNRA software for ion beam data, with cross-section data from IBANDL. SEM/EDX and XRD data were processed for composition and crystallinity.