1：Experimental Design and Method Selection:

The study used phase-shifting edge lithography to fabricate nickel molds for creating nanomesh patterns, followed by UV-imprinting and Ag-paste filling to produce flexible transparent nanomesh electrode (FTNE) films. The design rationale was to optimize linewidth, pitch, and height for enhanced performance.

2：Sample Selection and Data Sources:

Six FTNE films with varying linewidths, pitches, and heights were prepared (FTNE-1 to FTNE-6) on PET substrates, as specified in Table 1 of the paper.

3：List of Experimental Equipment and Materials:

Equipment included a UV source, photoresist (AZ GXR-601-14cP), developer (AZ 300MIF), nickel for electroforming, UV-curable polyurethane acrylate (MNR-03), Ag paste (TEC-PA-010), PET film, spectrophotometer (CM-3600d), four-point probe system, FE-SEM (S-4800), insulation tester (Fluke 1507), and network analyzer (Agilent Technologies E5071B). Materials included polydimethylsiloxane (PDMS) for phase masks.

4：Experimental Procedures and Operational Workflow:

The process involved fabricating a nickel mold via phase-shifting edge lithography, creating a nanotrench pattern with UV-imprinting, filling with Ag paste, and curing. Optical transmittance, sheet resistance, flexibility (bending tests up to 50,000 cycles), and EMI shielding effectiveness were measured.

5：Data Analysis Methods:

Transmittance was measured using a spectrophotometer, sheet resistance with a four-point probe, flexibility by resistance change after bending, and EMI SE with a network analyzer. Data were averaged from multiple samples, and theoretical models were compared for transmittance and figure of merit.