1：Experimental Design and Method Selection:

The study used finite-difference time-domain (FDTD) simulations to design parameters and analyze optical modes. Experimental fabrication involved nanoimprint lithography and subsequent lift-off.

2：Sample Selection and Data Sources:

Samples were fabricated on Si wafers with Ag-SiN-Ag configuration, using parameters from simulations. Reflection spectra and angle-resolved spectroscopy were measured.

3：List of Experimental Equipment and Materials:

Equipment includes FDTD solutions software, electron beam evaporation for Ag deposition, plasma-enhanced chemical vapor deposition (PECVD) for SiN, nanoimprint lithography setup, inductively coupled plasma reactive ion etching (ICP-RIE), scanning electron microscopy (SEM), and a home-made spectrometer. Materials include Ag, SiN, and Si wafers.

4：Experimental Procedures and Operational Workflow:

Ag film was deposited on Si wafer, SiN film was deposited via PECVD, Ag patches were fabricated using nanoimprint lithography and lift-off, SiN was etched using ICP-RIE, and samples were characterized with SEM and reflection measurements.

5：Data Analysis Methods:

Data were analyzed using FDTD simulations for electromagnetic field distributions and dispersion relations, and experimental data were compared with simulations.