研究目的
Probing interlayer excitons in a vertical van der Waals p-n junction using scanning probe microscopy technique.
研究成果
The study successfully demonstrates diode rectification and photovoltaic effects in a 2D p-n junction made of GaSe and MoS2, with photocurrent generation below the band gap attributed to interlayer excitons. Photoluminescence measurements confirm a new feature at 1.48 eV, and photocurrent mapping under 785 nm excitation validates exciton dissociation. DFT calculations support the formation of interlayer excitons and charge transfer. This work provides a foundation for developing 2D optoelectronic devices utilizing van der Waals heterostructures and interlayer excitons.
研究不足
The heterostructures are prepared by mechanical exfoliation, which may introduce point defects at the interface that can act as trap states for charge carriers, potentially limiting photocurrent generation. DFT calculations are approximate and do not fully account for quasi-particle corrections and exciton formation, which could affect accuracy. The rotation angle between layers in the experiment is not controlled, leading to variability in interlayer exciton properties. Oxidation of GaSe in air may slightly alter the interface, though efforts are made to minimize exposure.
1:Experimental Design and Method Selection:
The study involves fabricating a vertical p-n junction from bilayer n-type MoS2 and few-layer p-type GaSe using mechanical exfoliation onto HOPG. Current sensing atomic force microscopy (CSAFM) is used for electrical characterization, with home-built Au tips as top contacts. Density functional theory (DFT) calculations support the experimental findings.
2:Sample Selection and Data Sources:
Samples include bulk MoS2 crystal (purchased from 2D semiconductors, USA) and ?-GaSe crystal (prepared by Bridgman method). Heterostructures are prepared by mechanical exfoliation with a home-built stamping machine.
3:List of Experimental Equipment and Materials:
Equipment includes a home-built stamping machine, Xplora Raman spectrometer (HORIBA), AIST-NT scanning probe microscope, home-built Au tips, and lasers for excitation (532 nm, 638 nm, 785 nm). Materials include MoS2, GaSe, HOPG substrate, and KBr solution for tip etching.
4:Experimental Procedures and Operational Workflow:
Steps involve exfoliating flakes, characterizing with Raman spectroscopy and AFM to confirm thickness, performing I-V measurements in dark and under illumination, conducting photoluminescence measurements, and mapping photocurrent using CSAFM. DFT calculations are performed using QuantumEspresso.
5:Data Analysis Methods:
Data analysis includes fitting Raman spectra with Voigt functions, determining photovoltaic parameters (short circuit current, open circuit voltage, fill factor), and analyzing DFT results for electronic structure and charge transfer.
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