研究目的
Investigating the annealing behavior of irradiated silicon p-i-n diodes using current-voltage measurements to understand defect activity changes over time and their impact on device stability.
研究成果
The study demonstrates that irradiated silicon diodes exhibit a decrease in current initially due to defect annealing, followed by an increase after about 100 days as non-annealing defects alter their activity to act more as generation centers, increasing conductivity. The 701 meV defect is suggested as a key contributor. This behavior, stable over 250 days, aids in understanding the stability of silicon radiation detectors, with implications for future research on higher fluences and detailed defect characterization.
研究不足
The measurements were not performed at specific day intervals due to temperature variations, potentially affecting consistency. The study is limited to a single fluence level (1e14 n-cm?2), and further investigations with higher fluences and techniques like DLTS are needed for comprehensive understanding.
1:Experimental Design and Method Selection:
The study used current-voltage (I-V) measurements to investigate reverse annealing effects in silicon diodes irradiated with 1 MeV neutrons. The rationale was to monitor changes in electrical properties over time to understand defect behavior.
2:Sample Selection and Data Sources:
A commercial silicon p-i-n photodiode (Hamamatsu S3590-08) with an active area of 1 cm2 and thickness of 300 μm was irradiated to a fluence of 1e14 n-cm?2 at the National Energy Cooperation of South Africa.
3:List of Experimental Equipment and Materials:
Equipment included a Keithley 6487 picoammeter with a voltage source, a personal computer (PC) with Microsoft Excel and an add-in utility for control, an RS-232 cable for connection, and a fridge for storing the sample. The diode was the primary material under test.
4:Experimental Procedures and Operational Workflow:
I-V measurements were taken at room temperature (300 ± 2 K) in the dark, before and after irradiation. Measurements were performed in voltage steps (0.01 V to 0.1 V, 0.1 V to 1 V, 1 V to 100 V in reverse bias, and 0.01 V steps in forward bias with a current limit of 2.5 mA). Time between measurements was set to 1 s for stabilization. After irradiation, the sample was stored at sub-zero temperature for 2 weeks to allow radioactive decay, then measured periodically over 225 days under controlled temperature conditions.
5:01 V to 1 V, 1 V to 1 V, 1 V to 100 V in reverse bias, and 01 V steps in forward bias with a current limit of 5 mA). Time between measurements was set to 1 s for stabilization. After irradiation, the sample was stored at sub-zero temperature for 2 weeks to allow radioactive decay, then measured periodically over 225 days under controlled temperature conditions.
Data Analysis Methods:
5. Data Analysis Methods: Data were analyzed by generating I-V profiles and trend plots at fixed voltages (e.g., 0.2 V for forward bias and 90 V for reverse bias) to observe changes in current over time, indicating defect activity and annealing effects.
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