研究目的
To elucidate the charge separation process in particulate photocatalysts using intrinsic silicon as a model system and understand how asymmetric band bending drives directional charge separation.
研究成果
Asymmetric band bending induced by carrier-selective contacts drives diffusion-dominated charge separation in photocatalysts. A small band edge offset of 0.45 eV can generate sufficient photovoltage for water splitting. This provides guidance for designing efficient photocatalysts, particularly for Si and III-V semiconductors with protective layers.
研究不足
The study uses a model system (intrinsic Si) which may not fully represent all photocatalysts, especially metal oxides with different properties like high defect densities and low carrier mobility. Simulations assume idealized conditions and do not account for all recombination losses or spatial variations in interface energetics at very small scales (<15 nm).
1:Experimental Design and Method Selection:
Used intrinsic silicon wafers with carrier-selective contacts (n+ or p+ doped back contacts and TiO2 front contacts grown by ALD) to model charge separation. Applied device simulation (SCAPS3307) to analyze results.
2:Sample Selection and Data Sources:
Intrinsic Si wafers from University Wafer, Inc.; TiO2 layers grown by ALD; samples characterized using PEC measurements, Hall effect, and simulations.
3:List of Experimental Equipment and Materials:
Si wafers, TiO2 precursor (TDMAT), ALD system (Ultratech Fiji G2), potentiostat (Bio-Logic S200), monochromator (Newport Corp.), Hall measurement system (Quantum Design DynaCool PPMS), etc.
4:Experimental Procedures and Operational Workflow:
Cleaned Si wafers, doped back contacts, grew TiO2 by ALD, annealed in H2, deposited Ni co-catalyst, performed PEC and solid-state measurements, conducted simulations.
5:Data Analysis Methods:
Used SCAPS3307 for drift-diffusion simulations, analyzed J-V curves, external quantum yield, and Hall measurements.
独家科研数据包,助您复现前沿成果,加速创新突破
获取完整内容-
Hall measurement system
Quantum Design DynaCool PPMS
Quantum Design
Used for Hall effect measurements to characterize electrical properties of TiO2 films.
-
Reference electrode
SCE
CH Instruments
Used as a reference electrode in electrochemical measurements.
-
Si wafer
lightly n-doped Si with phosphorus dopant concentration of 1×1013 cm-3
University Wafer, Inc.
Used as the intrinsic silicon light absorber in the experiments.
-
ALD system
Ultratech Fiji G2
Ultratech
Used for atomic layer deposition of TiO2 and Al2O3 films.
-
Potentiostat
Bio-Logic S200
Bio-Logic
Used for photoelectrochemical measurements.
-
Monochromator
CS260-RG-4-MC-A
Newport Corp.
Used for external quantum yield measurements to produce monochromatic light.
-
Si photodiode
Thor Labs
Used for calibrating illumination intensity in experiments.
-
TiO2 precursor
TDMAT
Sigma Aldrich
Used as the titanium precursor for ALD growth of TiO2 films.
-
Ni pellet
Kurt J. Lesker corp.
Used for thermal evaporation to deposit Ni co-catalyst layers.
-
Al pellet
Kurt J. Lesker corp.
Used for thermal evaporation to deposit Al layers for ohmic contacts.
-
登录查看剩余8件设备及参数对照表
查看全部