研究目的
Investigating the influence of substrate and the suppression of photocorrosion in hematite films by TiO2 capping.
研究成果
Sn-doped hematite films were successfully deposited on various substrates, with FTO yielding the highest photoactivity. TiO2 capping reduced photocorrosion Faradaic efficiency from 0.47% to as low as 0.17%, demonstrating its protective role, albeit with a trade-off in photocurrent reduction. Future work should focus on achieving more conformal and dense TiO2 coatings for better protection.
研究不足
The TiO2 coatings may not provide complete coverage due to the rough and porous nature of the hematite films, limiting protection against photocorrosion. The study was conducted in specific electrolytes (H2SO4 and NaOH), and results may not generalize to other conditions. The photocurrent decreased with TiO2 coating due to band misalignments.
1:Experimental Design and Method Selection:
The study used aerosol pyrolysis (AP) for depositing Sn-doped hematite films on various substrates (FTO, Ti, stainless steel) and employed dip coating and spray pyrolysis for TiO2 capping to enhance stability. Photoelectrochemical measurements were conducted to assess performance and photocorrosion resistance.
2:Sample Selection and Data Sources:
Substrates included FTO/glass (TCO22-15, Solaronix), Ti sheet (Alfa Aesar 99.7%), and stainless steel (17248). Precursors were FeCl3 and SnCl2 for hematite, and titanium isopropoxide or titanium di-isopropoxide bis-acetylacetonate for TiO
3:7%), and stainless steel (17248). Precursors were FeCl3 and SnCl2 for hematite, and titanium isopropoxide or titanium di-isopropoxide bis-acetylacetonate for TiOList of Experimental Equipment and Materials:
2. 3. List of Experimental Equipment and Materials: Equipment included X-ray diffractometer (X'pert Philips MPD), FE-SEM (Hitachi SEM FE 4800), UV-Vis spectrometers (Cary 100 Conc, Mikropack NanoCalc 2000), optical microscope (Axio Scope A1, Zeiss), ICP-OES (Optima 8000, Perkin Elmer), potentiostat (Voltalab 10 PGZ-100), photocurrent spectra system (CIMPS-pcs, Zahner), solar simulator (150 W Xe arc lamp, Newport), lasers, and photodiode (S1337-1010BQ, Hamamatsu). Materials included chemicals from Sigma-Aldrich, Fluka, Penta, and Alfa Aesar.
4:Experimental Procedures and Operational Workflow:
Films were deposited by AP at 450-700°C, with TiO2 coatings applied via dip coating (annealed at 500°C) or spray pyrolysis (at 450°C). Characterization involved XRD, SEM, UV-Vis, and ICP analysis. Photoelectrochemical tests were performed in H2SO4 or NaOH electrolytes under illumination, with IPCE and polarization curves measured.
5:Data Analysis Methods:
Data were analyzed using software like VoltaMaster 4 for potentiostat control, and ICP for iron concentration determination. Statistical analysis was not explicitly mentioned, but results were compared across samples.
独家科研数据包,助您复现前沿成果,加速创新突破
获取完整内容-
FE-SEM
Hitachi SEM FE 4800
Hitachi
Used for morphological analysis of the films via field emission scanning electron microscopy.
-
UV-Vis spectrometer
Cary 100 Conc
Agilent
Used for optical absorption spectroscopy of the films.
-
Optical microscope
Axio Scope A1
Zeiss
Used for microscopic examination of the films.
-
ICP-OES
Optima 8000
Perkin Elmer
Used for inductively coupled plasma spectrometry to determine iron concentration in solutions.
-
Photodiode
S1337-1010BQ
Hamamatsu
Used for calibration of light sources in experiments.
-
Titanium isopropoxide
97 %
Sigma-Aldrich
Used as a precursor for TiO2 dip coating.
-
X-ray diffractometer
X'pert Philips MPD
Philips
Used for structural characterization of the deposited films by X-ray diffraction.
-
UV-Vis spectrometer
Mikropack NanoCalc 2000
Mikropack
Used for optical characterization of the films.
-
Potentiostat
Voltalab 10 PGZ-100
Radiometer Analytical
Used for photoelectrochemical measurements, including polarization curves.
-
Photocurrent spectra system
CIMPS-pcs
Zahner
Used for quantum efficiency measurements (IPCE) with a tunable light source.
-
Solar simulator
150 W Xe arc lamp
Newport
Used as a light source for photoelectrochemical experiments with AM1.5G filter.
-
FTO/glass
TCO22-15
Solaronix
Used as a substrate for film deposition, providing conductive and transparent properties.
-
Ti sheet
99.7 %
Alfa Aesar
Used as a metallic substrate for film deposition.
-
Stainless steel
17248
Used as a metallic substrate for film deposition, containing Cr, Ni, Ti.
-
Titanium di-isopropoxide bis-acetylacetonate
75 %w/w in i-PrOH
Sigma Aldrich
Used as a precursor for TiO2 spray pyrolysis.
-
登录查看剩余13件设备及参数对照表
查看全部