1：Experimental Design and Method Selection:

Titanium oxide thin films with different oxygen contents were grown on a-Al2O3 substrates using pulsed laser deposition (PLD) under varying oxygen pressures. The method was chosen for its capability to control stoichiometry by tuning oxygen pressure.

2：Sample Selection and Data Sources:

Commercial (0001)-oriented a-Al2O3 single crystalline substrates and a pure titanium target (99.99% purity) were used. Oxygen pressures ranged from 4e-4 Pa to 1e-3 Pa.

3：99% purity) were used. Oxygen pressures ranged from 4e-4 Pa to 1e-3 Pa. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: Equipment includes a PLD system with KrF excimer laser (λ=248 nm), X-ray diffractometer (Panalytical X'pert), cryo FESEM (JSM-6700F), AFM (MultiMode V), TEM (Talos F200X), and PPMS-9T (Quantum Design). Materials include high-purity oxygen gas and substrates.

4：Experimental Procedures and Operational Workflow:

Films were deposited at 850°C, with laser parameters set (50 mJ pulse energy, 2.5 mm2 ablation area, 2.0 J/cm2 energy density, 5 Hz repetition rate, 4.5 cm target-substrate distance). After deposition, films were cooled naturally. Characterization involved XRD, SEM, AFM, TEM, EELS, and resistivity measurements.

5：5 mm2 ablation area, 0 J/cm2 energy density, 5 Hz repetition rate, 5 cm target-substrate distance). After deposition, films were cooled naturally. Characterization involved XRD, SEM, AFM, TEM, EELS, and resistivity measurements. Data Analysis Methods:

5. Data Analysis Methods: XRD patterns analyzed for phase identification, EELS for oxygen content quantification, resistivity data fitted using Bloch-Grüneisen, VRH, TA, and SPH models.