研究目的
To investigate the deposition of molybdenum multisulfide thin-film photoanodes from a single-source precursor for photoelectrochemical hydrogen generation, optimizing synthesis conditions and deposition duration.
研究成果
The 20 min deposition time produced the most compact and efficient MoS2/Mo2S3 composite nanorod arrays with a thickness of 193 nm, achieving the highest photocurrent density (4 mA/cm2) and photosensitivity (6.78). This optimized condition enhances charge separation and transportation, making it suitable for solar hydrogen generation applications.
研究不足
The study is limited to specific deposition conditions (temperature, precursor concentration, times) and may not generalize to other precursors or methods. The films showed some sulfur deficiency and pin-hole effects leading to dark current. Thicker films (e.g., 25 min) had reduced performance due to poor electron penetration and increased recombination.
1：Experimental Design and Method Selection:
The study used aerosol-assisted chemical vapor deposition (AACVD) with a single-source precursor [CpMo(SMe)2]2 to deposit thin films on FTO substrates at 550°C under argon flow for varying times (10, 15, 20, 25 min).
2：Sample Selection and Data Sources:
FTO-coated glass substrates were used, cleaned with distilled water and acetone. Precursor solutions were prepared in THF at 0.01 M concentration.
3：01 M concentration. List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Equipment included a tube furnace, ultrasonic humidifier for aerosol generation, FE-SEM, AFM, XRD, EDX, Raman spectrometer, XPS, UV-Vis spectrophotometer, and Autolab electrochemical workstation. Materials included [CpMo(SMe)2]2, THF, argon gas, FTO substrates, and electrolyte solutions (Na2SO3 and Na2S).
4：Experimental Procedures and Operational Workflow:
Precursor solution was nebulized into aerosol, carried by argon into the furnace at 550°C. Films were deposited for specified times, cooled under argon, and characterized for morphology, structure, and optical properties. PEC studies were conducted using a three-electrode system with Ag/AgCl reference and Pt counter electrodes under light and dark conditions.
5：Data Analysis Methods:
Data were analyzed using techniques such as XRD for crystal structure, SEM/AFM for morphology, EDX for composition, UV-Vis for optical properties, and electrochemical methods (J-V curves, EIS) for PEC performance.
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FE-SEM
JSM-6701F
JEOL
Analyzing surface morphology and thickness of thin films
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XRD
6000
Shimadzu
X-ray powder diffraction analysis
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XPS
K-Alpha
Thermo Fisher Scientific
X-ray photoelectron spectroscopy measurements
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UV-Vis Spectrophotometer
2600
Shimadzu
Recording optical absorption spectrum
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Electrochemical Workstation
PGSTAT 302N
Autolab
Conducting photoelectrochemical studies
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NMR Spectrometer
Lambda 400 MHz
JEOL
Measuring 1H and 13C NMR spectra
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AFM
XE-70
Park Systems
Determining surface topology and roughness
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Raman Spectrometer
RE04
Renishaw
Raman scattering analysis
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TGA
TGA/SDTA851e
Mettler Toledo
Thermal decomposition temperature analysis
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FTO Substrate
Sigma-Aldrich
Conducting glass substrate for deposition
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