研究目的
To investigate the wettability and spreading kinetics of binary SneCr alloy on polycrystalline CVD diamond compacts, focusing on the effects of temperature and Cr content on wetting behavior and interfacial carbide formation.
研究成果
The addition of Cr to Sn significantly improves wettability on CVD diamond, with optimal performance at 4 wt% Cr. Wetting initiates at 750°C, and spreading is controlled by chemical reaction kinetics. A nano-sized Cr7C3 layer forms at the interface, enhancing wetting. Temperature critically influences carbide growth and wetting behavior, with higher temperatures accelerating kinetics but potentially causing issues like Cr particle concentration at high Cr contents.
研究不足
The study is limited to polycrystalline CVD diamond and SneCr alloys; other substrates or alloy systems were not explored. The experiments were conducted in vacuum, which may not represent all practical environments. The analysis assumes certain thermodynamic models (e.g., infinite dilute regular solution) that may not fully capture real behavior. Graphitization of diamond at higher temperatures was noted as a concern but not deeply investigated in this work.
1：Experimental Design and Method Selection:
The study used the sessile drop method to investigate wettability and spreading kinetics. Thermodynamic analysis was conducted to elucidate carbide formation.
2：Sample Selection and Data Sources:
Polycrystalline CVD diamond compacts (10 μm thick on WC substrate) and binary Sn-xCr (x=0,1,2,4,6 wt%) powder alloys prepared by mechanical mixing of Sn and Cr powders.
3：List of Experimental Equipment and Materials:
CVD diamond compacts from Suzhou Jiaozuan Superhard Nanocoatings Co. Ltd., Sn powder (99.99% purity, ~50 μm), Cr powder (99.7% purity, ~20 μm), ball milling machine, cylindrical die, vacuum chamber (<1e-3 Pa), electrical resistance tube furnace, digital camera, drop shape analysis software, low-speed diamond saw, epoxy resin, polishing equipment, Phenom ProX SEM, Sigma 500 field emission SEM with EDS, XPert Pro XRD.
4：99% purity, ~50 μm), Cr powder (7% purity, ~20 μm), ball milling machine, cylindrical die, vacuum chamber (<1e-3 Pa), electrical resistance tube furnace, digital camera, drop shape analysis software, low-speed diamond saw, epoxy resin, polishing equipment, Phenom ProX SEM, Sigma 500 field emission SEM with EDS, XPert Pro XRD. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Samples were cleaned ultrasonically, assembled, heated in vacuum. For elevating temperature experiments: heated to 400°C at 30°C/min, held 30 min, then to 950°C at 2°C/min. For isothermal experiments: heated to 700,750,800,900°C at 30°C/min, held for 2h. Contact angles and droplet radii recorded. Post-wetting, samples cut, polished, etched in HNO3, and characterized by SEM and XRD.
5：2h. Contact angles and droplet radii recorded. Post-wetting, samples cut, polished, etched in HNO3, and characterized by SEM and XRD. Data Analysis Methods:
5. Data Analysis Methods: Contact angle analysis with software (±3° accuracy), spreading kinetics analyzed using reaction-limited spreading model, thermodynamic calculations for Gibbs free energy, Arrhenius law for activation energy, SEM and XRD for microstructure characterization.
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XPert Pro X-ray diffractometer
XPert Pro
PANalytical B.V.
Used for phase identification via XRD.
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CVD diamond compact
Suzhou Jiaozuan Superhard Nanocoatings Co. Ltd.
Used as the substrate for wetting experiments.
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Sn powder
Changsha Tianjiu Co. Ltd.
Component of the SneCr alloy for wetting experiments.
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Cr powder
Changsha Tianjiu Co. Ltd.
Component of the SneCr alloy for wetting experiments.
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Ball milling machine
Used to mix Sn and Cr powders to prepare SneCr alloys.
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Cylindrical die
Used to cold press mixed powders into ingots.
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Vacuum chamber
Used for wetting experiments under vacuum.
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Electrical resistance tube furnace
Used to heat samples during wetting experiments.
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Digital camera
Used to record wetting and spreading behaviors.
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Drop shape analysis software
Used to measure contact angles with ±3° accuracy.
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Low-speed diamond saw
Used to cut wetted samples.
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Phenom ProX SEM
Phenom ProX
Phenom
Used for microstructure characterization.
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Sigma 500 field emission SEM
Sigma 500
Used for microstructure characterization with EDS.
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