1：Experimental Design and Method Selection:

The study uses a bottom-up approach involving capillary microstamping, metal-assisted chemical etching, solid-state dewetting, and galvanic displacement reactions to create dense layers of 3D gold nanodendrites on silicon substrates. Theoretical models include surface diffusion and capillarity effects for dewetting.

2：Sample Selection and Data Sources:

p-Type (100)-oriented silicon wafers with specific resistivity are used. Topographically patterned silicon (tpSi) is prepared with regular arrays of indentations. Samples include tpSi with gold films annealed at various temperatures and subjected to GDRs for different durations.

3：List of Experimental Equipment and Materials:

Equipment includes a Balzers BAE 120 evaporator for gold deposition, a tube furnace for annealing, a Zeiss AURIGA SEM for imaging, a WITec Alpha 300R Raman microscope for SERS measurements, and a Cary 6000i UV-Vis-NIR spectrophotometer for catalytic tests. Materials include HAuCl4, HF, NaBH4, 4-NP, ethanol, and DTNB.

4：Experimental Procedures and Operational Workflow:

Steps involve preparing tpSi with indentations, depositing a 35 nm gold film, annealing at temperatures from 400°C to 1000°C for 2 hours, performing GDRs in HAuCl4/HF solution for times from 0 to 15 minutes, and characterizing with SEM, Raman spectroscopy, and UV-vis spectroscopy.

5：Data Analysis Methods:

SEM image analysis using ImageJ for particle size and circularity. Raman spectra averaged from multiple spots; mapping with integration times. UV-vis data fitted with first-order rate law using linear regression in Origin 2017.