研究目的
Investigating the performance of electrochromic devices with varying tungsten oxide thickness, focusing on coloration efficiency and its dependence on thickness.
研究成果
The coloration efficiency of the hybrid electrochromic device increases with WO3 thickness, reaching a maximum of 184 cm2/C at 200nm, which is the highest reported. This is explained by replacing surface charge density with volume charge density in the efficiency formula. The devices show high optical transmission and amorphous structure, suitable for smart window applications. Future work could explore other materials or optimization of interfacial properties.
研究不足
The study is limited to room temperature depositions and specific thickness range of WO3 (44nm to 200nm). The mechanical pressing for device assembly might not be optimized for all applications. The explanation for coloration efficiency dependence involves assumptions that may not cover all parameters like charge transport mechanisms or defect densities.
1:Experimental Design and Method Selection:
The study involves fabricating a four-layer electrochromic device with ITO, Nafion membrane, and WO3 layers. WO3 and ITO thin films are deposited using reactive DC magnetron sputtering at room temperature. The coloration efficiency is analyzed based on Beer-Lambert's law with a modified formula using volume charge density.
2:Sample Selection and Data Sources:
Soda lime glass substrates are used. WO3 thickness is varied from 44nm to 200nm by changing deposition times (30, 45, 60, 90, 120 minutes), labeled as 30-G, 45-G, 60-G, 90-G, 120-G.
3:List of Experimental Equipment and Materials:
Equipment includes reactive DC magnetron sputtering system with Advanced Energy power supply (MDX 1KW), profilometer (Bruker 3D Non-contact Profiler), X-ray diffractometer (Xpert Pro with Cu Kα radiation), Raman spectrometer (Horiba Jobin Yvon Lab Ram with 532nm excitation), UV-Vis spectrophotometer (Cary 60), cyclic voltammetry and chronoamperometry setup (Biologic SP-300), SEM. Materials include metallic tungsten target (
4:9% pure, size 380mm x 127mm), ITO target (In:
Sn::90:10, size 380mm x 127mm), Nafion 117 membrane (commercially procured, 183μm thick), argon and oxygen gases.
5:Experimental Procedures and Operational Workflow:
Clean glass substrates are used. ITO films (400nm) are deposited first. WO3 films are deposited on ITO with varying thicknesses. Nafion membrane is placed on WO3 using Nafion solution glue and pressed mechanically. Another ITO-coated glass is pressed on top. Devices are characterized using XRD, Raman, optical transmission, cyclic voltammetry, and chronoamperometry.
6:Data Analysis Methods:
Thickness measured by profilometry. Optical band gap evaluated using Tauc plot. Coloration efficiency calculated from transmission changes and charge intercalation using modified Beer-Lambert's law. Statistical analysis of reproducible results within experimental error.
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Profilometer
Bruker 3D Non-contact Profiler
Bruker
Measuring the thickness of ITO and WO3 thin films
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X-ray Diffractometer
Xpert Pro
PANalytical
Characterizing the crystalline structure of WO3 thin films with Cu Kα radiation
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UV-Vis Spectrophotometer
Cary 60
Agilent
Measuring optical transmission and absorption in the wavelength range 200nm to 1100nm
Cary 60 UV-Vis Spectrophotometer
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Magnetron Sputtering System
MDX 1KW
Advanced Energy
Depositing ITO and WO3 thin films using reactive DC magnetron sputtering
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Raman Spectrometer
Lab Ram
Horiba Jobin Yvon
Analyzing vibrational spectra of WO3 thin films with 532nm excitation wavelength
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Cyclic Voltammetry and Chronoamperometry Setup
SP-300
Biologic
Performing electrochemical measurements including cyclic voltammetry and chronoamperometry on the electrochromic devices
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Nafion Membrane
Nafion 117
Chemours
Serving as the ion conducting layer in the electrochromic device
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Tungsten Target
Source material for depositing WO3 thin films via sputtering
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ITO Target
Source material for depositing ITO thin films via sputtering
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