1：Experimental Design and Method Selection:

The study used filtered cathodic vacuum arc (FCVA) deposition to grow aluminium thin films on glass and silicon substrates, varying working pressure (0.1, 0.25, 0.5, 1 Pa) and deposition time (1, 2, 5, 10, 20 min) to investigate their effects on optical and structural properties. Theoretical models included dynamic scaling theory for growth analysis.

2：1, 25, 5, 1 Pa) and deposition time (1, 2, 5, 10, 20 min) to investigate their effects on optical and structural properties. Theoretical models included dynamic scaling theory for growth analysis. Sample Selection and Data Sources:

2. Sample Selection and Data Sources: Substrates were glass slides and silicon (100) wafers, cleaned ultrasonically in Hellmanex solution, acetone, and ethanol. Data were obtained from spectrophotometry, RBS, SEM, profilometry, and AFM measurements.

3：List of Experimental Equipment and Materials:

Equipment included a 90° pulsed FCVA system (Plasma Technologies), mechanical profilometer DektakXT (Bruker), Lambda 1050 spectrophotometer (Perkin Elmer), S5200 SEM (Hitachi), RBS setup with a 2 MeV Van de Graaff accelerator, and NTEGRA Spectra II AFM (NTMDT). Materials included aluminium targets (99.99% purity), argon gas, and various cleaning solvents.

4：99% purity), argon gas, and various cleaning solvents. Experimental Procedures and Operational Workflow:

4. Experimental Procedures and Operational Workflow: Substrates were precleaned in vacuum with argon flow and DC bias. Deposition was performed at specified pressures and times without intentional heating or bias. Post-deposition, thickness and roughness were measured with profilometry, reflectance with spectrophotometry, morphology with SEM and AFM, and composition with RBS.

5：Data Analysis Methods:

Data were analyzed using SIMNRA software for RBS simulations, dynamic scaling theory for roughness evolution, and standard statistical methods for reflectance calculations (e.g., solar weighted reflectance using ASTM G173-03).