AFM-assisted investigation of conformal coatings in electronics

摘要： Purpose – This paper aims to presents a new method of investigation of local properties of conformal coatings utilized in microelectronics. Design/methodology/approach – It is based on atomic force microscopy (AFM) technique supplemented with the ability of local electrical measurements, which apart from topography acquisition allows recording of local impedance spectra, impedance imaging and dc current mapping. Potentialities of the proposed AFM-assisted approach have been demonstrated on commercially available epoxy-coated electronic printed boards in as-received state and after six-year service. Findings – The technique proved to be capable of identi?cation, spatial localization and characterization of conformal coating defects. Practical implications – The proposed approach can be utilized for assessment of protective ?lm state in such demanding ?elds as electronics or electrotechnics where the classical techniques of anticorrosion coatings investigation cannot be employed due to small element dimensions and relatively low coating thickness. Originality/value – The approach adopted by the author is novel in the ?eld of organic coatings investigation.