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Ozone-mediated Controllable Hydrolysis for High Quality Amorphous NbO <sub/>x</sub> Electron Transport Layer in Efficient Perovskite Solar Cells
摘要： Amorphous NbOx electron transport layer (ETL) shows great potential for boosting the power conversion efficiency (PCE) of perovskite solar cells (PSCs) at low temperature (< 100 °C). To date, it is still a challenge to simultaneously control the hydrolysis of NbOx precursor solution and reduce the impurities of NbOx ETLs during low-temperature solution processing under ambient conditions. Herein, for the first time, we report ozone (O3) as a strong ligand to stabilize Nb salt solution under ambient conditions. The above procedure not only provides the formation of a highly repeatable amorphous NbOx film by suppressing the hydrolysis of the solution but also reduces the OH content in the film, which decreases the defect intensity and improves the conductivity of the NbOx ETL. Thus, the formation of highly repeatable NbOx ETL-based PSCs are obtained; moreover, these PSCs have high PCE of 19.54% and 16.42% on rigid and flexible substrate, respectively, much higher than the devices based on ETLs from a solution without an O3 treatment.
关键词： NbOx,electron transport layer,perovskite solar cell,amorphous oxide semiconductors,low temperature
更新于2025-09-19 17:13:59
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Oxygen Vacancy Controlled SiZnSnO Thina??Film Inverters with High Gain
摘要： Amorphous SiZnSnO (a-SZTO) thin film are succesfully deposited to control the electrical characteristics by changing the oxygen partial pressure [p(O2)] ratio during the deposition. As the p(O2) ratio increase, the on current, off current, and the field effect mobility (μFE) decrease and the threshold voltage (Vth) shift to the positive direction, gradually. This phenomenon occurred because the oxygen vacancies (VO) in the channel were suppressed due to the effect of oxygen injected during the deposition. To explore the possibility that the device can be applied to integrated thin film circuit and operate well in the application, the n-type only inverters are fabricated using VO controlled thin film transistors (TFTs). All inverters have clear voltage transfer characteristics (VTC) and well operated in the range of 3 V to 15 V of VDD. When Vth shift to positive direction in enhancement mode (E-mode), the voltage transition region (Vtr) of the inverter also shift to positive direction. The highest voltage gain is measured to be about 26.554 V/V at 15 V of VDD. It is proposed to be able to fabricate the inverters and control the transition value of VTC of the inverter simply by changing p(O2) ratio of E-mode TFT.
关键词： thin film transistors,n-type,amorphous oxide semiconductors,oxygen partial pressure
更新于2025-09-19 17:13:59
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Exploiting In Situ Redox and Diffusion of Molybdenum to Enable Thin-Film Circuitry for Low-Cost Wireless Energy Harvesting
摘要： Direct additive fabrication of thin-film electronics using a high-mobility, wide-bandgap amorphous oxide semiconductor (AOS) can pave the way for integration of efficient power circuits with digital electronics. For power rectifiers, vertical thin-film diodes (V-TFDs) offer superior efficiency and higher frequency operation compared to lateral thin-film transistors (TFTs). However, the AOS V-TFDs reported so far require additional fabrication steps and generally suffer from low voltage handling capability. Here, these challenges are overcome by exploiting in situ reactions of molybdenum (Mo) during the solution-process deposition of amorphous zinc tin oxide film. The oxidation of Mo forms the rectifying contact of the V-TFD, while the simultaneous diffusion of Mo increases the diode’s voltage range of operation. The resulting V-TFDs are demonstrated in a full-wave rectifier for wireless energy harvesting from a commercial radio-frequency identification reader. Finally, by using the same Mo film for V-TFD rectifying contacts and TFT gate electrodes, this process allows simultaneous fabrication of both devices without any additional steps. The integration of TFTs alongside V-TFDs opens a new fabrication route for future low-cost and large-area thin-film circuitry with embedded power management.
关键词： additive fabrication,amorphous oxide semiconductors,thin-film circuitry,large-area electronics,solution process
更新于2025-09-04 15:30:14
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[IEEE 2018 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Kyoto, Japan (2018.6.21-2018.6.22)] 2018 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Development of Memristor Characteristic Device Using In-Ga-Zn-O Thin Film
摘要： In this presentation, we propose an amorphous oxide semiconductors (AOSs) In-Ga-Zn-O(IGZO) thin film for a memristor characteristic device. We fabricated the memristor characteristic device active layer using IGZO and electrodes using aluminum by physical vapor deposition (PVD). The Al/IGZO/Al cell device showed the bipolar switching characteristic of a switching voltage 2 and reproducibility 10.
关键词： memristor characteristic,IGZO,amorphous oxide semiconductors,Al
更新于2025-09-04 15:30:14