Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

摘要： In this paper, a comparison of TiO2 thin ?lms prepared by magnetron sputtering with a continuous and pulsed gas ?ow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin ?lms deposited with a gas impulse had a nanocrystalline rutile structure instead of ?brous-like anatase obtained with a continuous gas ?ow. TiO2 thin ?lms deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO2 thin ?lms.