1：Experimental Design and Method Selection:

TiO2 thin films were deposited by two various magnetron sputtering techniques: medium frequency (MF MS) and gas impulse (GI MS). The main difference between the two used sputtering techniques was the change of the pressure during the deposition process, which was a result of applied gas-supplying mode.

2：Sample Selection and Data Sources:

Thin films were deposited on various substrates, including silicon, fused silica, and Ti6Al4V metallic alloys due to different measurement methods used to determine the properties of TiO

3：List of Experimental Equipment and Materials:

The sputtering apparatus was equipped with diffusion and rotary pumps. High-purity metallic titanium targets were sputtered with the use of a DPS power supply working in a unipolar mode at the frequency of 165 kHz of sinusoidal pulses with the voltage amplitude of

4：8 kV. Experimental Procedures and Operational Workflow:

Both deposition processes were conducted for 240 min. Thickness was measured using the Taylor Hobson optical profiler.

5：Data Analysis Methods:

Structural properties were analyzed using X-ray diffraction (XRD), Raman spectroscopy, and transmission electron microscopy (TEM). Surface properties were determined by scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and wettability measurements. Optical properties were analyzed with the use of transmittance and reflectance measurements. Mechanical properties were analyzed by nanoindentation and scratch resistance measurements.