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- 摘要
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[Micro/Nano Technologies] Micro and Nano Fabrication Technology Volume 1 || Fabrication of Metallic Nanodot Arrays
摘要： Metal nanodot arrays exhibit unique optical characteristics, and they are expected to find widespread applications in biosensors and various optical devices. In this section, simple and efficient manufacturing processes are introduced for metal nanodot arrays. These processes are based on the combination of thin metal film coatings deposited on substrates and thermal dewetting. The first process discussed herein is a conventional thermal dewetting method. With this method, it is shown that the average dot diameter can be controlled based on the chosen process conditions. The second process is based on the use of grid patterning on coated metal films. This process can allow fabrication of nanodot arrays with uniform dot diameters and achieve highly ordered alignment of dots. The third process generates a metal nanodot array based on a self-organization manner on a nanogrid-patterned substrate. It constitutes a high-productivity process based on the transfer of the metal nanodot array to an adhesive film. The basic mechanisms underlying these processes are discussed herein.
关键词： Productivity,Metal coating,Dot transfer,Surface energy,Metal nanoparticles,Agglomeration,Nano plastic forming,Optical characteristics,Grid patterning,Self-organization,Biosensors,Thermal dewetting
更新于2025-09-10 09:29:36
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A Room-Temperature High-Conductivity Metal Printing Paradigm with Visible-Light Projection Lithography
摘要： Fabricating electronic devices require integrating metallic conductors and polymeric insulators in complex structures. Current metal-patterning methods such as evaporation and laser sintering require vacuum, multistep processes, and high temperature during sintering or postannealing to achieve desirable electrical conductivity, which damages low-temperature polymer substrates. Here reports a facile ecofriendly room-temperature metal printing paradigm using visible-light projection lithography. With a particle-free reactive silver ink, photoinduced redox reaction occurs to form metallic silver within designed illuminated regions through a digital mask on substrate with insignificant temperature change (<4 °C). The patterns exhibit remarkably high conductivity achievable at room temperature (2.4 × 107 S m?1, ≈40% of bulk silver conductivity) after simple room-temperature chemical annealing for 1–2 s. The finest silver trace produced reaches 15 μm. Neither extra thermal energy input nor physical mask is required for the entire fabrication process. Metal patterns were printed on various substrates, including polyethylene terephthalate, polydimethylsiloxane, polyimide, Scotch tape, print paper, Si wafer, glass coverslip, and polystyrene. By changing inks, this paradigm can be extended to print various metals and metal–polymer hybrid structures. This method greatly simplifies the metal-patterning process and expands printability and substrate materials, showing huge potential in fabricating microelectronics with one system.
关键词： hybrid material printing,metal patterning,high conductivity,flexible electronics,room-temperature printing
更新于2025-09-10 09:29:36
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Thermometry of photosensitive and optically induced electrokinetics chips
摘要： Optically induced electrokinetics (OEK)-based technologies, which integrate the high-resolution dynamic addressability of optical tweezers and the high-throughput capability of electrokinetic forces, have been widely used to manipulate, assemble, and separate biological and non-biological entities in parallel on scales ranging from micrometers to nanometers. However, simultaneously introducing optical and electrical energy into an OEK chip may induce a problematic temperature increase, which poses the potential risk of exceeding physiological conditions and thus inducing variations in cell behavior or activity or even irreversible cell damage during bio-manipulation. Here, we systematically measure the temperature distribution and changes in an OEK chip arising from the projected images and applied alternating current (AC) voltage using an infrared camera. We have found that the average temperature of a projected area is influenced by the light color, total illumination area, ratio of lighted regions to the total controlled areas, and amplitude of the AC voltage. As an example, optically induced thermocapillary flow is triggered by the light image-induced temperature gradient on a photosensitive substrate to realize fluidic hydrogel patterning. Our studies show that the projected light pattern needs to be properly designed to satisfy specific application requirements, especially for applications related to cell manipulation and assembly.
关键词： Thermocapillary flow,Optically induced electrokinetics,Infrared camera,Hydrogel patterning,Temperature distribution,OEK chip
更新于2025-09-10 09:29:36
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[IEEE 2018 20th International Conference on Transparent Optical Networks (ICTON) - Bucharest (2018.7.1-2018.7.5)] 2018 20th International Conference on Transparent Optical Networks (ICTON) - Structuring of Magnetic Nanoparticle Fluids for Decorative and Functional Printing and Coating
摘要： Printing and coating of magnetic inks is widely used in the field of magnetic barcode labels. Nanoparticle inks have gained increasing interest in the field of printed electronics. Controlling the transport of magnetic nanoparticle fluids by external magnetic fields is nowadays mainly applied in environmental and biomedical research, e.g. in order to transport functionalised magnetic particles for drug delivery, sensing, thermal cancer therapy, or for the extraction of pollutants in waste water cleaning. Application examples of field assisted nanoparticle assembly or fluid control in coating and printing, e.g. for the structural colour generation in photonics, are recently emerging. In this paper, we address the topic of field assisted patterning by the design of a versatile magnetic pattering and structuring platform for field assisted nanoparticle assembly and locally tailored pattern formation in printing and thin film coating. 2D finite element modelling for tailored magnetic field patterning, as well as experimental inkjet printing and coating results for Fe2O3 iron oxide nanoparticles on glass are presented and discussed. The developed print patterning technique is of interest for decorative and functional printing and coating, e.g. for further developments in the application field of smart security tags.
关键词： superparamagnetic nanoparticles,coating,patterning system design,inkjet printing,nanoparticle inks,field assisted patterning
更新于2025-09-09 09:28:46
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Plasma Etching Processes for CMOS Devices Realization || Plasma Etch Challenges for Gate Patterning
摘要： The patterning of the gate electrode is a critical step for transistor fabrication. For years, doped polysilicon (pSi) has been used as a gate metal while silicon dioxide has been used as a gate dielectric. After SiO2 and pSi deposition, the gate was patterned by conventional lithography and plasma etching (described in Chapters 3 and 2, respectively). At each technological generation, the length of the gate and the thickness of the gate dielectric were reduced. However, when the thickness of the gate oxide was reduced below a few nanometers, the tunneling current increased. In addition, high-performance CMOS circuits take advantage of different work functions for the gate metals between P and N transistors. For all these reasons, the standard doped pSi/SiO2 structures shifted towards dual metal (different metal for N and P transistors) high-k dielectric structures. Initially, the dual metal was obtained with different dopings of pSi, and, today, it is obtained by integrating different metal materials between the N and P transistors. The high-k dielectrics were initially based on SiON/SiO2 layers and then shifted to hafnium-based dielectrics (HfO2, HfSiON, etc.).
关键词： high-k dielectric,transistor fabrication,plasma etching,gate patterning,metal gate
更新于2025-09-09 09:28:46
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Processing and integration of graphene in a 200?mm wafer Si technology environment
摘要： We present insights into processes of cleaning, patterning, encapsulation, and contacting graphene in a 200 mm wafer pilot line routinely used for the fabrication of integrated circuits in Si technologies. We demonstrate key process steps and discuss challenges and roadblocks which need to be overcome to enable integration of this material with Si technologies.
关键词： contacting,patterning,graphene,Si technologies,encapsulation
更新于2025-09-09 09:28:46
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Production and Characterization of Vacuum Deposited Organic Light Emitting Diodes
摘要： A method for producing simple and efficient thermally-activated delayed fluorescence organic light-emitting diodes (OLEDs) based on guest-host or exciplex donor-acceptor emitters is presented. With a step-by-step procedure, readers will be able to repeat and produce OLED devices based on simple organic emitters. A patterning procedure allowing the creation of personalized indium tin oxide (ITO) shape is shown. This is followed by the evaporation of all layers, encapsulation and characterization of each individual device. The end goal is to present a procedure that will give the opportunity to repeat the information presented in cited publication but also using different compounds and structures in order to prepare efficient OLEDs.
关键词： ambipolar,Donor-Acceptor,Thermally Activated Delayed Fluorescence,exciplex,Organic Electronics,patterning,thermal evaporation,Issue 141,OLED,Engineering
更新于2025-09-09 09:28:46
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UV-Curable Nanoimprint resist with Liquid Volume-Expanding Monomers
摘要： For ultraviolet nanoimprint lithography (UV-NIL), the resist volume shrinkage during curing not only influences the pattern fidelity but also induces defects in the demolding process due to strong adhesion. To address this issue, a novel nanoimprint resist was formulated and characterized in this work. The new resist formulation contains 3,9-diethyl- 3,9-bis(allyloxymethyl)-1,5,7,11- tetraoxastetraoxaspiro [5,5] undecane (DB-TOSU), which is a liquid spiro-orthocarbonate monomer that undergoes volume expansion upon acid-catalyzed polymerization. By mixing DB-TOSU with conventional volume-shrinking epoxy monomers at various weight ratios, the formulated resists had much reduced or even zero volume shrinkage. The resist volume shrinkage, elastic modulus, and demolding force decreased with increasing DB-TOSU weight ratio in resist formulation. When DB-TOSU reached 50 wt.%, the demolding force was reduced by 69% with an adequate elastic modulus (75 MPa) and low shrinkage (1.86%). This novel resist formulation has the potential to allow high-fidelity pattern replication and reduce demolding defects in UV-NIL.
关键词： surface patterning,resist,UV-curable,nanoimprint,adhesion
更新于2025-09-09 09:28:46
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Phenol-functionalized polymerization control additives for negative tone epoxide crosslinking molecular resists
摘要： Controlling undesired polymerization in nominally unexposed regions is critical to achieving high-resolution, defect-free patterns when using negative tone molecular resists based on the crosslinking of epoxides. Two onium salt additives, a photodecomposable nucleophile (PDN) and a photoacid generator (PAG), were functionalized with phenols in order to investigate their use as generalized additives capable of slowing crosslinking and improving the resolution of a variety of epoxide resists. Presented here is a phenol-functionalized PDN [tris(4-hydroxyphenyl)sulfonium tri?ate (TPS-OH-Tf )] and a phenol-functionalized PAG [tris(4-hydroxyphenyl)sulfonium antimonate (TPS-OH-SbF6)] used in combination with a model epoxide resist (4-Ep). Utilizing additives that contained phenols resulted in a decrease in resist sensitivity, but enabled higher additive loadings which could be used to offset this loss in sensitivity. Using TPS-OH-SbF6 did not provide enough polymerization control to prevent line broadening, and the use of TPS-OH-Tf was still required to achieve sub 35 nm 1:1 line:space patterns. Adding TPS-OH-Tf was also found to improve pattern collapse behavior at reduced (<25 nm) feature sizes. Initial patterning using 100 keV electron-beam lithography showed that the resolution of 4-Ep was improved to 15 nm 1:1 line:space patterns using these phenol-functionalized additives and demonstrate the potential of these additives to improve the resolution of a variety of epoxide crosslinking molecular resists.
关键词： phenol-functionalized additives,polymerization control,molecular resists,negative tone epoxide crosslinking,high-resolution patterning
更新于2025-09-09 09:28:46
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Patterned Si Film Electrode Fabricated on Shape Memory Alloy
摘要： A patterned Si ?lm electrode with lozenge-shaped tiles was fabricated on a Ti–50.5Ni current collector by masking with an expanded metal foil and its electrochemical properties were compared with those of a continuous Si ?lm electrode. Prior to Si ?lm deposition, structural and mechanical properties of the Ti–Ni current collector were investigated by means of DSC, XRD and tensile test. The Ti–Ni current collector was composed of austenitic (B2) phase which can leads to the stress induced martensitic transformation at room temperature. The patterned Si ?lm electrode yielded high initial ef?ciency of 83.4% and good capacity retention of 72.3%, and the enhanced structural stability compared to those of continuous Si ?lm electrode, indicating that the application of patterning process is a promising approach to improve electrochemical properties of Si ?lm electrode.
关键词： Shape Memory Alloy,Thin Film,Patterning,Silicon
更新于2025-09-04 15:30:14