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[IEEE 2019 1st International Conference on Advances in Science, Engineering and Robotics Technology (ICASERT) - Dhaka, Bangladesh (2019.5.3-2019.5.5)] 2019 1st International Conference on Advances in Science, Engineering and Robotics Technology (ICASERT) - Layer thickness effect on power conversion efficiency of a P <sub/>3</sub> HT:PCBM based organicsolar cell
摘要： In recent years Organic Solar Cells have become a prominent topic of research to achieve an optimum efficiency at low cost. By using the GPVDM software on this paper, we have analyzed the power conversion efficiency, changing simultaneously both the polymers and blending layer thickness of P3HT:PCBM based solar cell. Our main goal is to find which layer change keeps the power conversion efficiency output better. After comparing them, the result shows that setting the active layer (P3HT:PCBM) in an optimum layer thickness and varying the polymer (PEDOT:PSS) gives a better output of PCE. In our paper, from the data in both cases, The highest efficiency is 4.50 percent where P3HT:PCBM thickness is 2.2×10-7 m and PEDOT:PSS layer thickness is 1×10-7 m.
关键词： PEDOT:PSS,Organic solar cell,polymer layer,blending layer,active layer,PCE,P3HT:PCBM
更新于2025-09-16 10:30:52
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Surface improvement investigation of sol–gel SiO <sub/>2</sub> cladding for waveguide device passivation
摘要： The sol–gel method is a well-known process for SiO2 formation on top of a semiconductor-based waveguide. This method does not require expensive equipment or SiH4 gas. However, it may result in difficulty with wet-etching, which prevents proper current injection into the semiconductor layer. We have investigated the surface condition of sol–gel SiO2 on top of Si, and have confirmed that the main causes of the anti-etching property might be due to the formation of a polymer layer after the curing process. To improve the surface condition, plasma ashing, in addition to 700 °C curing, is proposed. Regular wet etching of SiO2 layer on Si with a ratio of 1800 nm min?1 has been successfully confirmed.
关键词： SiO2,waveguide passivation,plasma ashing,sol–gel method,polymer layer,wet etching
更新于2025-09-11 14:15:04