研究目的
Investigating the fabrication and performance of high-performance vertical p-PbI2/n-WS2 heterostructure photodetectors enhanced by photogating effect.
研究成果
The PbI2/WS2 heterostructure photodetectors exhibit high photoresponsivity and specific detectivity, attributed to the photogating effect. The facile synthesis method and excellent performance suggest potential for future high-performance optoelectronic devices.
研究不足
The study is limited by the kinetics-driven growth instability of PbI2, which affects the homogeneity of nanoplates. The photogating effect's efficiency may vary with material quality and interface properties.
1:Experimental Design and Method Selection:
The study employs a two-step vapor deposition method to synthesize PbI2/WS2 heterostructures, utilizing WS2 as a substrate for PbI2 growth to improve material quality and device performance.
2:Sample Selection and Data Sources:
WS2 monolayers are synthesized on SiO2/Si substrates, followed by PbI2 deposition to form vertical heterostructures.
3:List of Experimental Equipment and Materials:
A tube furnace system for vapor deposition, optical microscope, AFM, XRD, PL measurement system, TEM, and EBL for device fabrication.
4:Experimental Procedures and Operational Workflow:
WS2 growth at 1150°C, PbI2 deposition at 370°C, device fabrication via EBL, and optoelectronic characterization under vacuum.
5:Data Analysis Methods:
Electrical and optoelectronic properties are measured using a probe station and semiconductor analyzer, with photoresponsivity and EQE calculated from photocurrent measurements.
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Atomic Force Microscope
Bruker Multimode 8
Bruker
Characterization of the morphology and thickness of nanoplates.
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Confocal microscope system
WITec alpha-300
WITec
Photoluminescence measurements of the samples.
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Transmission Electron Microscope
FEI Tecnai G2 F20
FEI
Structural characterization of the heterostructures.
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Probe Station
Lake Shore
Lake Shore
Electrical and optoelectronic characterization of the devices.
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Semiconductor Analyzer
Keithley 4200-SCS
Keithley
Measurement of electrical properties of the devices.
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WS2 powder
Alfa Aesar
Used as a substrate for the growth of PbI2 in the heterostructure.
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PbI2 powder
Sigma-Aldrich
Source material for the vapor deposition of PbI2 layers.
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Tube furnace system
Used for the vapor deposition of WS2 and PbI2 layers.
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X-ray diffractometer
Bruker
Analysis of the crystal structure and phase purity of the samples.
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E-beam lithography system
Raith 150 two
Raith
Fabrication of source and drain electrodes for the devices.
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