研究目的
To develop a direct synthesis method for fabricating an array of self-assembled WSe2/MoS2 heterostructures for next-generation logic devices and optoelectronics.
研究成果
The solution-based direct growth method successfully fabricated WSe2/MoS2 heterostructures with controlled alignments, demonstrating high rectification and promising optoelectrical properties. The photodiode array application showed potential for detecting light intensity and position, indicating a scalable approach for large-area electronic and optoelectronic applications.
研究不足
The synthesis process may require optimization for higher crystallinity and uniformity over larger areas. The performance of the heterostructures under different environmental conditions was not explored.
1:Experimental Design and Method Selection:
A solution-based direct growth method was used to fabricate WSe2/MoS2 heterostructures through directional precipitation. The internal convection flow (Marangoni flow) of the solution was manipulated to control the alignment of WSe2 wires over MoS2 wires.
2:Sample Selection and Data Sources:
MoS2 wires were formed on a SiO2/Si substrate via a dip-coating process, followed by the formation of WSe2 wires through a second dip-coating process.
3:List of Experimental Equipment and Materials:
Dip-coating setup, SiO2/Si substrates, MoS2 and WSe2 precursors, and metal contact pads (Au/Ti and Au/Pd).
4:Experimental Procedures and Operational Workflow:
The process involved the formation of MoS2 wires, followed by the controlled precipitation of WSe2 wires to form heterostructures with specific alignments. Metal contacts were then deposited for electrical characterization.
5:Data Analysis Methods:
Electrical and optoelectrical properties were characterized using a probe station and source meter. Photoresponse was measured under various wavelengths and intensities.
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Source meter
4200-SCS
KEITHLEY
Used for measuring the electrical properties of the devices.
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Light emitting diodes
L405P20, L450P1600MM, L520P50, HL6388MG
Thorlabs
Used as external light sources for photocurrent measurement.
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Controller
ITC4005QCL
Thorlabs
Used to operate the light emitting diodes.
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Detector
1Z01500 with 150c-V-P-JCM
OPHIR
Used to measure the actual incident light power to the device.
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Dip-coating setup
Used for the formation of MoS2 and WSe2 wires on substrates.
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SiO2/Si substrates
Used as the base material for the fabrication of heterostructures.
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Metal contact pads
Au/Ti and Au/Pd
Used for efficient charge injection in the fabricated devices.
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Probe station
M5VC
MSTECH
Used for electrical and optoelectrical characterization of the devices.
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