研究目的
Investigating the optical detection of hydrogen peroxide (H2O2) using grating structures of silver nanoparticles (AgNPs) fabricated by the plasmonic plating method.
研究成果
The plasmonic plating technique combined with interference laser exposure enables the fabrication of sensor chips with silver grating structures for H2O2 detection. The method offers a simple optical setup for measuring diffraction intensity changes, with potential for downsizing and application in portable devices.
研究不足
The sensitivity of the method is pH-dependent, with reduced sensitivity at pH 4 and pH 9. The method may also exhibit cross-reactivity with compounds like sodium chloride and human serum.
1：Experimental Design and Method Selection:
The study employs the plasmonic plating method with interference laser exposure to fabricate AgNP grating structures on a AuNP-decorated glass plate for H2O2 detection.
2：Sample Selection and Data Sources:
AuNP substrates are prepared by sputtering gold thin film on glass plates and annealing. AgNP grating structures are fabricated using an interference exposure setup with a green laser beam.
3：List of Experimental Equipment and Materials:
Includes a green laser (MSL-III-532, CNI), motorized linear translation stages (HPS80-50X-M5, Sigma Koki), mechanical shutter (F573, Suruga Seiki), and a portable measurement system with a red laser (CPS635R, Thorlabs) and CCD camera (UI-2410SE-M-GL, IDS).
4：Experimental Procedures and Operational Workflow:
AgNP grating structures are fabricated by interference laser exposure, and H2O2 detection is performed by measuring the diffraction intensity change upon H2O2 application.
5：Data Analysis Methods:
The diffraction intensity change is analyzed using RCWA simulation and temporal intensity changes are measured with a CCD camera.
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green laser
MSL-III-532
CNI
Used for interference exposure in the plasmonic plating method to fabricate AgNP grating structures.
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motorized linear translation stages
HPS80-50X-M5
Sigma Koki
Used to control the XY position of the AuNP substrate during interference exposure.
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red laser
CPS635R
Thorlabs
Used in the portable measurement system to irradiate the AgNP grating chip for diffraction intensity measurement.
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CCD camera
UI-2410SE-M-GL
IDS
Used to measure the diffracted laser beam intensity in the portable measurement system.
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mechanical shutter
F573
Suruga Seiki
Used to regulate the interference exposure time.
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