研究目的
Investigating the ferroelectric and photoluminescence properties of Pr-doped (Bi0.5Na0.5)TiO3–BaTiO3 thin film fabricated by the pulsed laser deposition method.
研究成果
The Pr-doped (Bi0.5Na0.5)TiO3–BaTiO3 thin film exhibited enhanced ferroelectric polarization and excellent photoluminescence properties, making it a promising material for multifunctional MEMS actuator and optical device applications.
研究不足
The study was limited by the inability to determine the epitaxial properties of the film due to the limitation of the XRD instrument used. Additionally, the polarization of the thin film was inferior to the ceramic counterpart, possibly due to larger domain size in the bulk material crystallized at higher temperatures.
1:Experimental Design and Method Selection:
The study involved the fabrication of Pr-doped (Bi0.5Na0.5)TiO3–BaTiO3 thin film using the pulsed laser deposition (PLD) method on a SrRuO3-electroded Pb(Mg1/3Nb2/3)O3–PbTiO3 single-crystal substrate. The influence of substrate temperature, oxygen pressure, and deposition time on the film's properties was studied.
2:5Na5)TiO3–BaTiO3 thin film using the pulsed laser deposition (PLD) method on a SrRuO3-electroded Pb(Mg1/3Nb2/3)O3–PbTiO3 single-crystal substrate. The influence of substrate temperature, oxygen pressure, and deposition time on the film's properties was studied.
Sample Selection and Data Sources:
2. Sample Selection and Data Sources: The samples were prepared from a ceramic target of 0.93(Bi0.5Na0.5)TiO3–0.07BaTiO3 doped with 0.5 mol% Pr, sintered at 1200°C for 2 h.
3:93(Bi5Na5)TiO3–07BaTiO3 doped with 5 mol% Pr, sintered at 1200°C for 2 h.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Equipment used included X-ray diffraction (XRD, D8 Focus, Bruker, Germany), field emission scanning electron microscopy (FESEM, S-4800, Hitachi, Japan), ferroelectric analyzer (TF2000, Aixacct, Aachen, Germany), and piezoresponse force microscopy (PFM, MFP-3D, Asylum Research, USA).
4:Experimental Procedures and Operational Workflow:
The film was deposited at 780°C and 30 Pa, with in-situ annealing performed at an oxygen pressure followed by natural cooling.
5:Data Analysis Methods:
The crystallographic structure was analyzed using XRD, surface and cross-sectional structure by FESEM, ferroelectric properties by a ferroelectric analyzer, and domain structure by PFM.
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