研究目的
Designing a plasmonic cloaking device using an ENZ region made of alternating layers of the graphene-silica stack, which is robust against the inclusion geometry and capable of working in a large bandwidth.
研究成果
A cloaking device was successfully designed using an ENZ region made of alternating layers of a graphene-silica stack, demonstrating robustness against the inclusion geometry and capable of working in a large bandwidth. The use of Au boundaries with optimized thicknesses facilitated the excitation of a plasmon mode in the ENZ region.
研究不足
The cloak is designed to work only for TM incidence due to the use of Au for sealing the ENZ’s boundaries and covering the inclusion. The performance is optimized for specific thicknesses of Au boundaries.
1：Experimental Design and Method Selection:
The cloak is designed using an ENZ region made of alternating layers of a graphene-silica stack, with boundaries sealed by Au. The design is optimized for TM incidence.
2：Sample Selection and Data Sources:
The inclusion shape is chosen arbitrarily to demonstrate the cloak's robustness.
3：List of Experimental Equipment and Materials:
Graphene-silica stack, Au for sealing boundaries.
4：Experimental Procedures and Operational Workflow:
The transmission coefficient is computed for TM polarization, with the thickness of Au boundaries optimized to maximize transmission.
5：Data Analysis Methods:
The reflection coefficient is calculated using Faraday’s law of induction, and the magnetic field distribution inside the cloak is analyzed.
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