1：Experimental Design and Method Selection:

The study involved the preparation of CNC films through evaporation induced self-assembly (EISA) and their subsequent infiltration with alkali ions (Li+, Na+, K+). The films' photonic and electrochemical properties were characterized using various techniques.

2：Sample Selection and Data Sources:

CNC suspensions with 3 wt% and pH of 3 were used for film preparation. The films were characterized using Polarized Optical Microscopy (POM), X-ray Photoelectron Spectroscopy (XPS), Electrochemical Impedance Spectroscopy (EIS), Cyclic Voltammetry (CV), and chronoamperometry.

3：List of Experimental Equipment and Materials:

Equipment included an XP-200 profilometer, Asylum Research MFP-3D Stand Alone system for AFM, LEICA IC80 HD camera for macro-imaging, Olympus BX51 microscope for POM, Thermo Nicolet 6700 spectrometer for FTIR, Axis Supra spectrometer by Kratos Analytical for XPS, and Gamry Instruments Reference 600 potentiostat for electrochemical characterization.

4：Experimental Procedures and Operational Workflow:

CNC films were prepared and infiltrated with alkali ions. Their optical, chemical, and electrochemical properties were then characterized. Transistors and inverters were fabricated using the infiltrated CNC films as gate dielectrics and characterized electrically.

5：Data Analysis Methods:

Data from EIS, CV, and chronoamperometry were analyzed to determine the films' electrochemical properties. Transistor performance was evaluated based on mobility, On/Off ratios, and subthreshold swings.