研究目的
Investigating the development of efficient L-shaped surface grating couplers with device layouts compatible with lithographic technologies for low-loss input/output optical interfaces in silicon nanophotonic technologies.
研究成果
The study successfully demonstrated L-shaped grating couplers with SWG metamaterials achieving low coupling loss and reduced back-reflections. Apodized couplers showed potential for sub-decibel performance, compatible with commercial nanophotonic foundry settings, indicating a significant advancement in silicon nanophotonic technologies.
研究不足
The study focuses on specific lithographic technologies and foundry settings, potentially limiting applicability to other fabrication environments. The robustness to minimum feature size restrictions, while demonstrated, may require further validation across a broader range of conditions.
1：Experimental Design and Method Selection:
The study employs L-shaped waveguide radiation profiles and subwavelength grating (SWG) metamaterials for designing uniform and apodized grating couplers.
2：Sample Selection and Data Sources:
Devices were designed on SOI substrates with a 300-nm Si layer and 720-nm BOX, operating with TE-like waveguide mode at a wavelength of 1550 nm.
3：List of Experimental Equipment and Materials:
SOI substrates, deep-UV steppers, scanning electron microscopy for imaging fabricated devices.
4：Experimental Procedures and Operational Workflow:
Fabrication in STMicroelectronics photonic foundry facilities using 300 mm SOI and CMOS production line.
5：Data Analysis Methods:
Rigorous 3D FDTD calculations for predicting directionality and coupling loss, comparison of designed and fabricated couplers' performance.
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