研究目的
To explore and develop lithographic preparations for obtaining plasmonic HfN nanostructures and spatially mapping their LSPRs using cathodoluminescence (CL) spectroscopy.
研究成果
The study successfully demonstrated the fabrication of plasmonic HfN nanoparticles using both FIB milling and EBL. The nanoparticles exhibited clear surface plasmon resonances, paving the way for their use in applications requiring materials robustness. The similarity in plasmon modes between FIB-milled and EBL-prepared structures suggests broad applicability of the fabrication methods.
研究不足
The study faced challenges in the lithographic preparation of HfN nanoparticles due to the material's high melting point and chemical inertness. The CL spectroscopy was limited to the visible range due to background CL from the Si substrate.
1：Experimental Design and Method Selection:
The study involved the fabrication of HfN nanoparticles using two methods: focused ion beam (FIB) milling and electron-beam lithography (EBL). The plasmonic properties were characterized using cathodoluminescence (CL) spectroscopy.
2：Sample Selection and Data Sources:
High-quality HfN thin films were prepared by reactive sputter coating. These films were then used to fabricate nanoparticles via FIB milling and EBL.
3：List of Experimental Equipment and Materials:
Equipment included a FEI Helios Nanolab 600 SEM for FIB milling, a Raith e-LINE system for EBL, and a Thermo Fisher 650 Quanta SEM for CL measurements. Materials included HfN thin films and various resists for lithography.
4：Experimental Procedures and Operational Workflow:
The process involved depositing HfN thin films, milling nanoparticles using FIB, preparing nanoparticle arrays via EBL, and characterizing the plasmonic properties using CL spectroscopy.
5：Data Analysis Methods:
The optical properties of the nanoparticles were analyzed using CL spectroscopy, and the results were compared with finite difference time domain (FDTD) simulations.
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