研究目的
The objective of the present work is to study the structural, morphological, optical and electrical properties of PbS:Al thin films as a function of different Al doping percentage.
研究成果
Device quality PbS:Al thin films were prepared via NSP technique. The successful incorporation of Al ions in the PbS system was confirmed through XRD and EDS. The study found that the increase in Al doping concentration leads to substantial increase in band gap, which may help to enhance the efficiency of the PV cell. The optimized Al doping level (6 wt%) on PbS thin film was employed for the heterostructure device fabrication, which exhibited a solar cell efficiency value of 0.44%. The work provides a foundation for future improvements in heterostructure conversion efficiency through proper understanding and optimization of deposition parameters and materials.
研究不足
The solar cell efficiency of the fabricated heterostructure device is low (0.44%), which may be due to the disturbance of electron hole pair transition between the prepared p-type PbS and n-type CdS structure. The efficiency can be improved in future by changing the deposition parameters, using a different n-type window layer instead of CdS, and optimizing the front and back electrodes.
1：Experimental Design and Method Selection:
Nebulizer spray pyrolysis (NSP) technique was used for the deposition of PbS and Al doped PbS thin films on soda lime glass substrates. The method was chosen for its ability to produce thin layer films of a variety of conducting and semiconducting materials with controlled deposition rate and film thickness.
2：Sample Selection and Data Sources:
Lead nitrate (PbNO3) and Aluminium III chloride (AlCl3) were used as host (PbS) and dopant (Al) precursors, respectively. Thiourea precursor was used as the source for the formation of sulfur (S).
3：List of Experimental Equipment and Materials:
X-Pert Pro X-ray diffractometer, Stylus Profilometer detector model number SJ-301, Scanning electron microscope (EVO 18 ZEISS), Atomic force microscopy (AFM), energy dispersive X-ray analysis (EDS), UV–Vis–NIR Spectrophotometer (Lambda PerkinElmer), spectrofluorometer, four probe instrument, Keithley source meter (Model-2450).
4：0).
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: The substrates were cleaned and dried before deposition. The precursors were dissolved in de-mineralized water and mixed together. The substrate temperature was kept constant at 200°C. The nebulizer nozzle was moved in x-y direction by stepper motor to attain uniform films.
5：Data Analysis Methods:
The structural parameters were calculated from the XRD pattern. The optical band gap was determined from optical data's by using Tauc relation. The electrical properties were determined using four probe instrument at room temperature.
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