1：Experimental Design and Method Selection:

The study used pulsed laser deposition (PLD) to grow SrO:Bi3+ (

2：2 mol%) phosphor thin films on Si (100) substrates in vacuum and different O2 atmospheres at various substrate temperatures using different lasers (Nd:

YAG, KrF, ArF).

3：Sample Selection and Data Sources:

SrO:Bi3+ (0.2 mol%) powder was prepared by the metal nitrate sol-gel combustion synthesis technique. Si (100) wafers were used as substrates.

4：2 mol%) powder was prepared by the metal nitrate sol-gel combustion synthesis technique. Si (100) wafers were used as substrates. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: Equipment included a Nd:YAG laser (266 nm), KrF laser (248 nm), ArF laser (193 nm), Bruker D8 Advance diffractometer, Shimadzu SPM-9600 AFM, JEOL JSM-7800F SEM, He-Cd laser PL system, Gatan MonoCL4 accessory, and Ion ToF SIMS.

5：Experimental Procedures and Operational Workflow:

The deposition chamber was evacuated to a base pressure and then backfilled with O2 to specific pressures. The target was ablated using different lasers at various substrate temperatures, frequencies, and energies. The films were characterized using XRD, AFM, SEM, PL, CL, and ToF SIMS.

6：Data Analysis Methods:

XRD analysis for crystallinity, AFM for surface morphology and roughness, SEM for sample morphology, PL and CL for luminescence properties, and ToF SIMS for elemental distribution.