研究目的
Investigating the reaction pathways of Pt CVD using (COD)PtMe2 – xClx (x = 0, 1, 2) on functionalized self-assembled monolayers (SAMs) as models for organic substrates and developing an effective room-temperature Pt CVD process.
研究成果
An effective room-temperature Pt CVD process was developed using (COD)PtMe2 – xClx (x = 0, 1, 2) precursors and 1,4-cyclohexadiene as a coreactant. The radical trap significantly increased Pt deposition by scavenging methyl and chlorine radicals, preventing recombination and reducing SAM damage. This approach suggests a new method to control CVD processes and lower substrate temperatures.
研究不足
The study shows that the deposition process leads to chemical damage of the SAM layer and little Pt deposition without the use of a radical trap. The effectiveness of the radical trap in increasing Pt deposition was demonstrated, but the process may still require optimization for different substrates and applications.
1：Experimental Design and Method Selection:
The study involved the use of (COD)PtMe2 – xClx (x = 0, 1, 2) precursors for Pt CVD on functionalized SAMs. The reaction pathways were investigated using residual gas analysis, x-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry.
2：Sample Selection and Data Sources:
Functionalized SAMs with ZCOOH, ZCH3, or ZOH terminal groups were used as models for organic substrates.
3：List of Experimental Equipment and Materials:
A vhv chamber for CVD, a residual gas analyzer, a PHI VersaProbe II Scanning XPS Microprobe, and an ION TOF IV spectrometer for TOF SIMS measurements were used.
4：Experimental Procedures and Operational Workflow:
CVD was performed at room temperature with and without the radical trap 1,4-cyclohexadiene. The gaseous products were analyzed, and the deposited films were characterized.
5：Data Analysis Methods:
The data were analyzed using CASAXPS for XPS data and standard techniques for SIMS and residual gas analysis data.
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