研究目的
Demonstrating the fabrication of vertical microring lasers using a single epitaxial growth and single-side lithography, aiming to simplify the manufacturing process while maintaining or improving optical performance.
研究成果
The study successfully demonstrated a new vertical microring laser using a single epitaxial growth and conventional single-side lithography, offering a simpler fabrication scheme. Despite some limitations, the approach allows for overcoming drawbacks without adding extra steps to the manufacturing procedure, promising lower thresholds and higher power operation in future devices.
研究不足
The lasers emitted less optical power than expected, with devices smaller than 40 μm not exhibiting lasing due to surface recombination, propagation losses, and reduced coupling factor. Improvements such as optimizing the dry etch process and using quantum dots as the active media are suggested.
1：Experimental Design and Method Selection:
The study employs a vertical coupling approach with two vertically stacked waveguide core layers for active-passive integration, avoiding complex processes like wafer bonding or regrowth.
2：Sample Selection and Data Sources:
Microring lasers with ring radii ranging from 5 to 80 μm were fabricated.
3：List of Experimental Equipment and Materials:
The epitaxial layers were grown by metal–organic chemical vapor deposition (MOCVD), and the devices were fabricated using conventional photoresist and plasma etching.
4：Experimental Procedures and Operational Workflow:
The fabrication involved defining the rings by plasma etching, selective wet etching, dry etching of the bus waveguide, spin-coating polyimide, metallization, and thinning the substrate.
5：Data Analysis Methods:
The performance of the lasers was evaluated through electrical and optical characteristics, including series resistance, threshold currents, and emission spectra.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容
