研究目的
Investigating the effect of the loading path on the multicracking of Nickel thin films on Kapton substrate.
研究成果
The study demonstrates that the loading path significantly affects the multicracking patterns and stress fields in Nickel thin films on Kapton substrates. Equibiaxial loading leads to a random mud-crack pattern, while complex loading results in a square roman-bricks pattern. The in situ x-ray diffraction experiments provide insights into the stress evolution during crack initiation and multiplication, highlighting the importance of loading path in controlling crack patterns.
研究不足
The study focuses on Nickel thin films on Kapton substrates, and the findings may not be directly applicable to other material systems or substrate types. The complexity of the loading paths and the interpretation of the stress fields require sophisticated equipment and analysis techniques.
1:Experimental Design and Method Selection:
The study used an experimental set-up combining controlled biaxial deformation, x-ray diffraction, and digital image correlation to analyze the multicracking of Nickel thin films on Kapton substrate under different loading paths.
2:Sample Selection and Data Sources:
Nickel thin films were deposited onto 25-mm-thick polyimide (Kapton) cruciform substrates and produced at room temperature by physical vapor deposition.
3:List of Experimental Equipment and Materials:
A biaxial tensile tester at the DiffAbs beamline of the synchrotron radiation facility SOLEIL, optical setup for digital image correlation, x-ray diffractometer, and a confocal microscope for ex situ observations.
4:Experimental Procedures and Operational Workflow:
Samples were biaxially stretched up to 10% strain following either a single equibiaxial path or a complex one. In situ x-ray diffraction experiments were performed to monitor the stress field in the thin film during the multicracking process.
5:Data Analysis Methods:
The sin2j method was adopted to determine the lattice strain evolution in the two principal in-plane directions. The macroscopic stress in Ni films was calculated with the x-ray elastic constant.
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