研究目的
To evaluate the stability of carbon nanotube cold cathode electron beam (C-beam) with vacuum brazing process for application in x-ray tube manufacturing.
研究成果
The vacuum brazing process at 790°C successfully bonded Kovar carrier and silicon substrates with minimal contact resistance and no electrical degradation of CNT emitters, making it viable for cold cathode based x-ray tube manufacturing.
研究不足
The study focuses on the brazing process and its effects on CNT emitters' electrical properties and stability, but further application in actual x-ray tube devices and long-term reliability tests are needed.
1:Experimental Design and Method Selection:
The study involved the bonding of carbon nanotube grown Si wafers to a metal carrier using vacuum brazing process to assess the electrical properties and stability of CNT emitters.
2:Sample Selection and Data Sources:
CNTs were vertically grown on Ni patterned silicon wafers using a triode DC-PECVD chamber. Kovar sheet was selected as the metal carrier.
3:List of Experimental Equipment and Materials:
Triode DC-PECVD chamber, Ni patterned silicon wafer, Kovar sheet, RF sputtering for Ni thin films deposition, Bag-08 (Ag72Cu28) brazing filler.
4:Experimental Procedures and Operational Workflow:
The process included CNTs growth, brazing process optimization, I-V measurement before and after brazing, and stability measurement of beam current.
5:Data Analysis Methods:
SEM observation for morphology, handy multi-meter for contact resistance measurement, I-V characteristics measurement.
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