研究目的
Investigating the effect of substrate bias and substrate/plasma generator distance on properties of a-C:H:SiOx films synthesized by PACVD.
研究成果
a-C:H:SiOx films with good mechanical properties and high hydrophobicity were synthesized on silicon substrates by PACVD method, combined with bipolar pulsed substrate biasing. The mechanical properties significantly improve when the amplitude of the substrate bias increases from –130 to –500 V and substrate/plasma generator distance decreases from 150 to 100 mm. The films show large hydrophobicity with a contact angle for water of about 91° and small total surface free energy of about 17.9 mN/m.
研究不足
The study is limited to the effects of substrate bias and substrate/plasma generator distance on the properties of a-C:H:SiOx films. The findings may not be generalizable to other types of films or deposition conditions.
1：Experimental Design and Method Selection:
The a-C:H:SiOx films were synthesized on silicon (100) and glass substrates by plasma-assisted chemical vapor deposition combined with pulsed bipolar substrate bias from mixtures of argon and polyphenylmethylsiloxane vapor. The process was investigated by controlling processing conditions such as amplitude of negative pulse of substrate bias and the distance between the substrate and plasma generator.
2：Sample Selection and Data Sources:
Silicon (100) and glass substrates were used. The films were characterized by nanoindentation technique, atomic force microscopy, Fourier transform infrared and Raman spectroscopy.
3：List of Experimental Equipment and Materials:
NanoTest 600 device for hardness and Young's modulus measurements, Centaur U HR complex for Raman spectra, Nicolet 5700 for FTIR spectra, AFM Solver P47 for surface roughness measurements, Linnik microinterferometer MII 4 for film thickness measurements.
4：Experimental Procedures and Operational Workflow:
The substrates were cleaned by conventional ultrasonic treatment and then treated in Ar plasma prior to film deposition. The films were deposited at different substrate biases and substrate/plasma generator distances.
5：Data Analysis Methods:
The Raman spectra were fitted by Gaussian curves. Hardness and Young's modulus were determined by Oliver–Pharr method. Contact angle and surface free energy were calculated using the Owen-Wendt equation.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容
