研究目的
Comparison of the electrical, optical, structural, and morphological properties of RF magnetron-sputtered ZnO and solution-processed ZnO nanoparticle buffer layers on ITO cathodes for use in inverted polymer solar cells (IPSCs).
研究成果
The study concluded that RF-sputtered ZnO buffer layers can be used in IPSCs, but their performance is affected by vertical phase segregation of the organic active layer. Intentional bias sweeping improved the performance by facilitating the diffusion of PC70BM through the PV-D4610 donor layer.
研究不足
The study did not explore the exact mechanisms underlying vertical phase segregation in detail. The performance of IPSCs with an RF-sputtered ZnO buffer layer was lower than that with a solution-processed ZnO NP buffer layer, indicating potential areas for optimization.
1：Experimental Design and Method Selection:
The study compared RF magnetron-sputtered ZnO and solution-processed ZnO NP buffer layers on ITO cathodes for IPSCs. Continuous sputtering was used to integrate the ZnO buffer layer in the ITO cathodes.
2：Sample Selection and Data Sources:
ITO electrodes and ZnO buffer layers were prepared on glass substrates at room temperature using batch-type DC and RF magnetron sputtering.
3：List of Experimental Equipment and Materials:
A DC and RF magnetron sputtering system with multi-cathode guns, ZnO and ITO ceramic targets, ZnO nanoparticle-dispersed solution, PV-D4610, PC70BM, MoO3-x, and Ag.
4：Experimental Procedures and Operational Workflow:
ITO and ZnO layers were sputtered on glass substrates. IPSCs were fabricated on ZnO-integrated cathodes and reference ZnO NPs/ITO electrodes. The performance was measured under 100 mW/cm2 illumination with AM 1.5 G irradiation.
5：5 G irradiation. Data Analysis Methods:
5. Data Analysis Methods: UV/Visible spectrometry, Hall measurement system, XRD, HRTEM, FE-SEM, NEXAS, UPS, and J-V characteristics measurement.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容-
UV/Visible spectrometer
JASCO V-570
JASCO
Used for investigating the optical properties of the ZnO buffer layers.
-
ZnO ceramic target
Dasom RMS
Used for sputtering ZnO buffer layers on ITO cathodes.
-
ITO ceramic target
Dasom RMS
Used for sputtering ITO electrodes on glass substrates.
-
DC and RF magnetron sputtering system
Used for sputtering ITO and ZnO layers on glass substrates.
-
Hall measurement system
HL550PC
Accent Optical Technology
Used for measuring the electrical properties of the ZnO buffer layers.
-
X-ray diffractometer
Used for analyzing the structural properties of the ZnO buffer layers.
-
High-resolution transmission electron microscope
Used for examining the microstructure and interface structure of the ZnO buffer layers.
-
Field emission scanning electron microscope
Used for examining the morphology of the ZnO buffer layers.
-
Near edge X-ray absorption spectroscopy
Used for analyzing the electronic structure near the conduction band of the ZnO buffer layers.
-
Ultraviolet photoelectron spectroscopy
Used for measuring the work functions of the ZnO buffer layers.
-
Solar simulator
Used for measuring the photocurrent density-voltage characteristics of IPSCs under 100 mW/cm2 illumination with AM 1.5 G irradiation.
-
登录查看剩余9件设备及参数对照表
查看全部
