研究目的
To study the influence of thermal annealing on the structural and optical properties of RF-sputtered LiTaO3 thin films.
研究成果
The study concludes that the optimal annealing temperature for LiTaO3 thin films is 600 °C, at which the films exhibit the best crystallinity and ordered structure, with refractive index, extinction coefficient, and optical band gap energy values consistent with those of lithium tantalate single crystal.
研究不足
The study is limited to the effects of annealing temperatures from 550 °C to 700 °C on the structural and optical properties of LiTaO3 thin films. The research does not explore the effects of other deposition parameters or substrates.
1:Experimental Design and Method Selection:
LiTaO3 thin films were prepared on Pt/Ti/SiO2/Si(100) substrate by RF magnetron sputtering and annealed at temperatures varying from 550 °C to 700 °C. The structural and optical properties were investigated using FESEM, GAXRD, XPS, Raman spectrum, and spectroscopic ellipsometry.
2:Sample Selection and Data Sources:
The target material was a calcined compressed ceramic powder with a purity of 99.9% and its Li/Ta mol ratio was 50/
3:9% and its Li/Ta mol ratio was 50/List of Experimental Equipment and Materials:
50. 3. List of Experimental Equipment and Materials: RF magnetron sputtering apparatus (FJL560, SKY Technology Development Limited Company of Chinese Academy of Sciences), field emission scanning electron microscope (S4800), x-ray diffractometer (Xpertpro-MPD), x-ray photoelectron spectroscopy (Escalab 250Xi), Raman spectrometer (Invia Reflex), spectroscopic ellipsometry (SE200-MSP).
4:Experimental Procedures and Operational Workflow:
The films were deposited using an RF power of 150 W at 0.8 Pa total deposition pressure, with O2 flow of 40 sccm and Ar flow of 10 sccm. After deposition, films were annealed at 550 °C to 700 °C for 60 min under O2-rich ambience.
5:8 Pa total deposition pressure, with O2 flow of 40 sccm and Ar flow of 10 sccm. After deposition, films were annealed at 550 °C to 700 °C for 60 min under O2-rich ambience. Data Analysis Methods:
5. Data Analysis Methods: Optical constants and optical band gap energy Eg were deduced by theoretically fitting experimental ellipsometric spectra with the Forouhi-Bloomer dispersion model.
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RF magnetron sputtering apparatus
FJL560
SKY Technology Development Limited Company of Chinese Academy of Sciences
Used for depositing LiTaO3 thin films on substrates.
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Field emission scanning electron microscope
S4800
Used for observing the morphology on the top surface and fractured cross section of the thin film.
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X-ray diffractometer
Xpertpro-MPD
Used for studying characteristics of layers’ crystalline structure.
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X-ray photoelectron spectroscopy
Escalab 250Xi
Used for quantitative analysis of the growing thin film.
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Raman spectrometer
Invia Reflex
Used for obtaining Raman spectra of the thin films.
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Spectroscopic ellipsometry
SE200-MSP
Used for measuring optical constants of the LiTaO3 thin film.
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