研究目的
Investigating the potential of rock-salt CdZnO ternary as a transparent conducting oxide (TCO) by analyzing its optical and electrical transport properties.
研究成果
The rock-salt CdZnO alloy has been identified as a potential TCO with improved characteristics with respect to CdO and other common TCOs. The incorporation of Zn yields a simultaneous enhancement of the Hall mobility and the free electron concentration, lowering the resistivity down to 1:95 (cid:2) 10(cid:3)4 X (cid:4) cm for the Cd0.9Zn0.1O film. Moreover, the absorption band-edge energy shifts to much larger energies with Zn, strongly increasing the transparency of these TCOs in the visible.
研究不足
The degradation of electron mobility for Zn contents larger than 15% likely results from grain boundary scattering and eventually from phase segregation between the rock-salt and wurtzite structures.
1：Experimental Design and Method Selection:
The study uses a combination of infrared reflectance and ultraviolet-visible absorption spectroscopies, together with Hall effect, to assess the optical and electrical transport characteristics of MOCVD-grown rock-salt CdZnO ternary.
2：Sample Selection and Data Sources:
CdZnO thin films were grown by MOCVD on r-plane sapphire substrates with nominal Zn contents ranging from 0 to 25%.
3：5%. List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: A Nicolet Magna-IR 760 Fourier Transform Infrared Spectrometer (FTIR) for infrared reflectance spectroscopy, a Jasco V-650 spectrophotometer for ultraviolet-visible absorption spectroscopy, and a Van der Pauw configuration for Hall effect measurements.
4：Experimental Procedures and Operational Workflow:
The growth temperature was set at 330 (cid:6)C, and the VI-II precursor ratio was kept at 5 in all the experiments. Infrared reflectance spectroscopy was carried out covering the range from 350 to 9000 cm(cid:3)1 at an incidence angle of 45(cid:6).
5：6). Data Analysis Methods:
5. Data Analysis Methods: The reflectance spectra were fitted using a dielectric function model to derive fundamental parameters including the film thickness, the plasma frequency, and the damping of the plasma resonance.
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