摘要： By combining the electronic structures of graphene and monolayer AsSb via van der Waals force interaction, the intrinsic p-type Schottky contact can be obtained. Here, a series of theoretic calculations are performed to survey the effects of interlayer coupling and the band realignment of graphene-AsSb heterointerface. It reveals that intrinsic p-type Schottky barriers of 0.184 and 0.381 eV are formed for the two types of configurations. Besides, the intrinsic electronic properties of graphene and AsSb are roughly preserved. When the external electric field is applied, the Schottky barrier can be effectively tuned up by changing the external electric field intensity and further convert the p-type contact into the n-type contact. A variation of the Schottky barriers indicates a partial Fermi level pinning at the interfaces of AsSb. It results from the low density of interfacial states between graphene and AsSb. The barrier height of AsSb and the corresponding contact type can be flexibly tuned, which is of great importance in the design of novel transistors based two-dimensional materials and they provide meaningful guidelines.