研究目的
To investigate the influence of Aluminium (Al) doping on the structural, morphological, optical and third-order nonlinear optical (NLO) properties of CdS thin films for photonic device applications.
研究成果
Al-doped CdS thin films exhibit enhanced third-order NLO susceptibility and optical limiting characteristics, making them promising materials for nonlinear optical devices and optical power limiting applications.
研究不足
The study is limited to the characterization of Al-doped CdS thin films prepared by spray pyrolysis technique. The NLO properties were measured under continuous wave laser excitation, which may differ under pulsed laser conditions.
1:Experimental Design and Method Selection:
The study employed the spray pyrolysis technique to prepare Pure CdS and Al-doped CdS (Cd1-xAlxS) thin films on glass substrates at 350oC. The structural, morphological, optical, and third-order NLO properties were analyzed using XRD, FESEM, UV-visible spectrophotometer, RTPL, and Z-scan techniques.
2:Sample Selection and Data Sources:
Thin films of Cd1-xAlxS with x= 0, 0.01, 0.05, and 0.1 were prepared. The samples were characterized for their structural, morphological, optical, and NLO properties.
3:01, 05, and 1 were prepared. The samples were characterized for their structural, morphological, optical, and NLO properties.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Bruker’s XRD, FESEM, UV-visible double-beam spectrophotometer, RTPL setup, Z-scan setup with a DPSS continuous wave laser at 532 nm.
4:Experimental Procedures and Operational Workflow:
The films were prepared by spray pyrolysis, characterized by XRD and FESEM for structural and morphological properties, UV-visible spectrophotometer for optical properties, RTPL for defect states, and Z-scan for NLO properties.
5:Data Analysis Methods:
The data were analyzed using Scherer’s formula for crystallite size, equations for optical band gap, and standard equations for NLO parameters from Z-scan data.
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