研究目的
Investigating the effect of nitrogen partial pressure on the phase formation (Cr, Cr2N, CrN) and, subsequently, on the properties of the produced coatings.
研究成果
The study successfully demonstrated that varying nitrogen partial pressure during DC reactive sputtering can control the phase formation in CrxNy films, which in turn significantly affects their microstructure, optical, and electrical properties. The findings provide valuable insights for tailoring CrxNy films for specific applications based on their phase composition.
研究不足
The study focuses on the influence of nitrogen partial pressure on the properties of CrxNy films, but other deposition parameters such as temperature and bias voltage were not varied. The optical and electrical properties are correlated with the phase formation, but the exact mechanisms of phase transitions are not deeply explored.
1：Experimental Design and Method Selection:
The study employed DC reactive ion sputtering to deposit CrxNy films on Si(100) wafers under varying nitrogen partial pressures. Structural and elemental analyses were conducted using XRD, TEM, and RBS. Optical properties were evaluated via spectroscopic ellipsometry, and electrical properties were assessed through resistivity measurements.
2：Sample Selection and Data Sources:
Commercial Si(100) wafers were used as substrates. The samples were cleaned and ion-etched before deposition. The nitrogen partial pressure was varied to produce different phases of CrxNy.
3：List of Experimental Equipment and Materials:
Balzers Sputtron II system for deposition, Philips EM 400T microscope for TEM, Bruker D8 Diffractometer for XRD, HORIBA-Jobin Yvon UVISEL 5 spectroscopic ellipsometer for optical analysis, and a four-point probe for electrical resistivity measurements.
4：Experimental Procedures and Operational Workflow:
The substrates were prepared and mounted into the deposition chamber. Films were deposited at room temperature with varying nitrogen partial pressures. Post-deposition, the films were analyzed for structural, optical, and electrical properties.
5：Data Analysis Methods:
XRD and TEM for structural analysis, RBS for elemental composition, spectroscopic ellipsometry for optical properties, and four-point probe for electrical resistivity.
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