1：Experimental Design and Method Selection:

A TVA system was used to deposit MoxSy thin film onto glass substrate. The TVA system consists of anode and cathode and it is used in thin film production under high vacuum conditions. The cathode is a simple electron gun and emits the electrons by using high ac current. The anode is a boat, contains the material to be coat. The MoS2 (purity 98%) was bought and used as anode material. The material placed inside of the anode boat. For the discharge, pressure of 1 x10-4 torr, duration of 160 second, filament current of 18 A, discharge current of 0.4 A, applied voltage of 150 V were selected.

2：4 A, applied voltage of 150 V were selected. Sample Selection and Data Sources:

2. Sample Selection and Data Sources: MoxSy thin film coating was done onto glass substrate.

3：List of Experimental Equipment and Materials:

A Panalytical Empryan XRD device was used for the microstructural characterization. Bragg-Brentano geometry and Pixel3D detector were used for the nano layer analysis. The thickness of the deposited film was measured as approximately 30 nm using a Filmetrics F20 interferometer and TT90 Spectroscopic ellipsometer. Zeiss Supra 40 VP field emission electron microscopy (FESEM) device was used for the surface imaging. Ambios Q-Scope atomic force microscopy was used to determining the two-dimension (2D), three-dimension (3D) surface images, average roughness, and grains distribution graphs of the coated surface. Attension theta contact angle measurement device was used for contact angle measurement. Four different heavy media were used for contact angle measurement. They were diiodomethane, ethylene glycol, formamide and distilled water. PerkinElmer LS 45 Fluorescence Spectrometer device was used for photoluminescence measurements. Renishaw inVia Raman Microscope RE 04 was used for Raman spectroscopy measurement. A 532 nm wavelength laser was used for the measurement. CSM Instrument Tribometer was used for friction coefficient measurement.

4：Experimental Procedures and Operational Workflow:

The thickness of the layer can be control by a quartz crystal thickness monitor. For the discharge, pressure of 1 x10-4 torr, duration of 160 second, filament current of 18 A, discharge current of 0.4 A, applied voltage of 150 V were selected.

5：4 A, applied voltage of 150 V were selected. Data Analysis Methods:

5. Data Analysis Methods: The Scherrer equation is used to calculate the crystallite size (D) values for the nano materials. The dislocation density (δ) and microstrain (ε) were calculated from equation 2 and equation 3, respectively. Optical properties were determined by Cauchy model. In the Cauchy dispersion model, the refractive index n (λ) as a function of the wavelength is given by; n(λ) = A! + B!/λ! + C!/λ!. Calculate the band gap energy of the coated thin film, the optical method was used. The band gap calculation, below equation is used; αhυ = A(hυ ? Eg)!.